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[(E)-[3-[acetyl(acetyloxy)amino]-1-[9-ethyl-6-(naphthalene-1-carbonyl)carbazol-3-yl]butylidene]amino] acetate

中文名称
——
中文别名
——
英文名称
[(E)-[3-[acetyl(acetyloxy)amino]-1-[9-ethyl-6-(naphthalene-1-carbonyl)carbazol-3-yl]butylidene]amino] acetate
英文别名
——
[(E)-[3-[acetyl(acetyloxy)amino]-1-[9-ethyl-6-(naphthalene-1-carbonyl)carbazol-3-yl]butylidene]amino] acetate化学式
CAS
——
化学式
C35H33N3O6
mdl
——
分子量
591.7
InChiKey
RHSKWWVRDZURKC-WIKZRCHHSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    6.2
  • 重原子数:
    44
  • 可旋转键数:
    11
  • 环数:
    5.0
  • sp3杂化的碳原子比例:
    0.23
  • 拓扑面积:
    107
  • 氢给体数:
    0
  • 氢受体数:
    7

文献信息

  • SILICON-CONTAINING RESIN COMPOSITION
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:EP3705534A1
    公开(公告)日:2020-09-09
    Provided are a silicon-containing resin composition with which it is possible to form a silica-based coating film in which generation of cracks is minimized, a method for forming a silica-based coating film using the silicon-containing resin composition, and a crack-free silica-based coating film formed using the silicon-containing resin composition. A silicon-containing resin composition including (A) a silicon-containing resin and (S) a solvent, wherein one or more selected from siloxane resins and polysilanes is used as the (A) silicon-containing resin, and the (S) solvent contains a cycloalkyl acetate having a specific structure. Cyclohexyl acetate is preferably used as the cycloalkyl acetate.
    本发明提供了一种含树脂组合物,使用该组合物可形成基涂膜,其中裂纹的产生减至最小;还提供了一种使用该含树脂组合物形成基涂膜的方法,以及一种使用该含树脂组合物形成的无裂纹基涂膜。含树脂组合物包括(A)含树脂和(S)溶剂,其中(A)含树脂使用硅氧烷树脂和聚硅烷中的一种或多种,(S)溶剂包含具有特定结构的环烷基乙酸酯。环烷基乙酸酯最好使用环己基乙酸酯。
  • Silicon-containing resin composition
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:US10689514B2
    公开(公告)日:2020-06-23
    A silicon-containing resin composition with which it is possible to form a silica-based coating film in which generation of cracks is minimized, a method for forming a silica-based coating film using the silicon-containing resin composition, and a crack-free silica-based coating film formed using the silicon-containing resin composition. The silicon-containing resin composition includes a silicon-containing resin and a solvent, in which one or more of siloxane resins and polysilanes is used as the silicon-containing resin, and the solvent contains a cycloalkyl acetate having a specific structure.
    一种含树脂组合物,使用该组合物可形成可最大限度减少裂纹产生的基涂膜;一种使用该含树脂组合物形成基涂膜的方法;以及一种使用该含树脂组合物形成的无裂纹基涂膜。含树脂组合物包括含树脂和溶剂,其中硅氧烷树脂和聚硅烷中的一种或多种用作含树脂,溶剂含有具有特定结构的环烷基乙酸酯。
  • Energy-sensitive resin composition
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:US10696845B2
    公开(公告)日:2020-06-30
    An energy-sensitive resin composition with which it is possible, even if the precursor polymer is heat-treated at low temperatures, to produce a film or molded article comprising an imide ring-containing polymer having excellent heat resistance, tensile elongation and chemical resistance with a low dielectric constant, or a film or molded article comprising an oxazole ring-containing polymer having excellent heat resistance, tensile elongation and chemical resistance. A method of manufacturing the film or molded article; a method of forming a pattern using the energy-sensitive resin composition; and a permanent film having excellent heat resistance, tensile elongation and chemical resistance. The energy-sensitive resin composition includes an imidazole compound, a resin precursor component, and a solvent, the resin precursor component being at least one of a monomer component including a diamine compound, a dicarbonyl compound and/or a tetracarboxylic acid dianhydride; and a precursor polymer having a repeating unit.
    一种能量敏感树脂组合物,使用该组合物,即使在低温下对前体聚合物进行热处理,也能生产出一种薄膜或模塑制品,该薄膜或模塑制品由具有优异耐热性、拉伸伸长率和耐化学性且介电常数较低的含亚胺环聚合物组成,或由具有优异耐热性、拉伸伸长率和耐化学性的含噁唑环聚合物组成。制造薄膜或模塑制品的方法;使用能量敏感树脂组合物形成图案的方法;以及具有优异耐热性、拉伸伸长率和耐化学性的永久性薄膜。能敏树脂组合物包括咪唑化合物、树脂前体组分和溶剂,树脂前体组分是单体组分中的至少一种,包括二胺化合物、二羰基化合物和/或四羧酸二酐;以及具有重复单元的前体聚合物。
  • ENERGY-SENSITIVE RESIN COMPOSITION
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:US20150338734A1
    公开(公告)日:2015-11-26
    The present invention provides an energy-sensitive resin composition, a method of manufacturing a polyimide film or a polyimide molded product in which said composition is used, and a method of forming a pattern in which said composition is used. The composition supplies a polyimide resin exhibiting exceptional thermal resistance and low permittivity even by a heat treatment at a low temperature. The composition contains polyamic acid obtained by reacting tetracarboxylic dianhydride and diamine, a solvent, and a compound (A) decomposing by the action of light and/or heat and generating a base and/or an acid. The method of manufacturing a polyimide film or a polyimide molded product includes forming a coating film or molded product comprising the composition and decomposing the compound (A) in the film or product through exposure or heating. The method of forming a pattern sequentially includes forming, selectively exposing, developing and heating the film or product.
  • LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LIGHT-EMITTING DISPLAY ELEMENT PANEL, AND LIGHT-EMITTING DISPLAY DEVICE
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:US20210309866A1
    公开(公告)日:2021-10-07
    The present invention provides: a liquid composition which can be suitably used for production of an optical film having a favorable fluorescence efficiency and includes quantum dots (A), a quantum dot-containing film obtained by drying and/or curing the liquid composition, an optical film for a light-emitting display element made of the quantum dot-containing film, a light-emitting display element panel including the optical film, and a light-emitting display equipped with the light-emitting display element panel. An ionic liquid (B), and a solvent (S) are incorporated into a liquid composition including quantum dots (A), in which the solvent (S) includes a solvent (S1), the solvent (S1) being a compound having a cyclic skeleton and including a heteroatom other than a hydrogen atom and a carbon atom.
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