申请人:ROBINSON Alex Philip Graham
公开号:US20160139506A1
公开(公告)日:2016-05-19
The present disclosure relates to novel fullerene derivatives, positive and negative photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays.
本公开涉及新颖的富勒烯衍生物、由其制备的正、负光刻胶组合物及其使用方法。这些衍生物、光刻胶组合物和方法非常适合使用紫外辐射、极紫外辐射、超出极紫外辐射、X射线、电子束和其他带电粒子射线进行高速、精细图案处理。