(2Z)-2-[(2Z)-2-[2-chloro-3-[(E)-2-(1,3,3-trimethyl-5-nitroindol-1-ium-2-yl)ethenyl]cyclohex-2-en-1-ylidene]ethylidene]-1,3,3-trimethyl-5-nitroindole

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 吲哚及其衍生物
• 英文名称: (2Z)-2-[(2Z)-2-[2-chloro-3-[(E)-2-(1,3,3-trimethyl-5-nitroindol-1-ium-2-yl)ethenyl]cyclohex-2-en-1-ylidene]ethylidene]-1,3,3-trimethyl-5-nitroindole
• 化学式: C32H34ClN4O4+
• 分子量: 574.1
• InChiKey: DWPZPPMMPDCDNT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.1
• 重原子数：
  41
• 可旋转键数：
  3
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.34
• 拓扑面积：
  97.9
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• Bakeable radiation-sensitive elements with a high resistance to chemicals
  申请人：Eastman Kodak Company

  公开号：EP1849600A1

  公开（公告）日：2007-10-31

  A singe- or multilayer radiation-sensitive element comprises on a substrate a radiation-sensitive coating that comprises a copolymer soluble or dispersible in aqueous alkaline solution and comprising (meth)acryl recurring units, imide recurring units, and amide recurring units derived from corresponding ethylenically unsaturated polymerizable monomers; the copolymer provides increased chemical resistance for the radiation-sensitive elements that can be negatively or positively working lithographic printing plate precursors.

  一种单层或多层辐射敏感元件包括在基底上的辐射敏感涂层，该涂层由可溶于或分散于碱性水溶液中的共聚物组成，共聚物包括由相应的乙烯不饱和可聚合单体衍生的（甲基）丙烯酸递归单元、亚胺递归单元和酰胺递归单元；共聚物为辐射敏感元件提供了更强的耐化学性，这些辐射敏感元件可以是负工作或正工作的平版印刷板前体。
• BAKEABLE LITHOGRAPHIC PRINTING PLATES WITH A HIGH RESISTANCE TO CHEMICALS
  申请人：Jarek Mathias

  公开号：US20090269554A1

  公开（公告）日：2009-10-29

  A singe- or multilayer lithographic printing plate precursor comprises on a substrate a radiation-sensitive coating that comprises a copolymer soluble or dispersible in aqueous alkaline solution and comprising (meth)acryl recurring units, imide recurring units, and amide recurring units derived from corresponding ethylenically unsaturated polymerizable monomers; the copolymer provides increased chemical resistance for the lithographic printing plate precursors which can be negatively or positively working.
• SENSITIZER/INITIATOR COMBINATION FOR NEGATIVE-WORKING THERMAL-SENSITIVE COMPOSITIONS USABLE FOR LITHOGRAPHIC PLATES
  申请人：Simpson Christopher D.

  公开号：US20110003123A1

  公开（公告）日：2011-01-06

  The radiation-sensitive composition and the negative working imageable element include a cationic IR absorber with tetraarylborate counteranion and an onium initiator with tetraarylborate counteranion. The use of these components provides high imaging sensitivity, good shelflife and high print run length.
• US7332257B2
  申请人：——

  公开号：US7332257B2

  公开（公告）日：2008-02-19
• US8137891B2
  申请人：——

  公开号：US8137891B2

  公开（公告）日：2012-03-20