SPENGLER, J. P.;SCHUNACK, W., ARCH. PHARM., 1984, 317, N 5, 425-430
作者:SPENGLER, J. P.、SCHUNACK, W.
DOI:——
日期:——
JPS5659762A
申请人:——
公开号:JPS5659762A
公开(公告)日:1981-05-23
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD FOR MANUFACTURING PLATED ARTICLE
申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US20190278178A1
公开(公告)日:2019-09-12
A chemically amplified positive-type photosensitive resin composition capable of forming a resist pattern having excellent cross-sectional perpendicularity of a nonresist section even when a resist pattern is formed on a metal surface, and a method for manufacturing a substrate with a template and a method for manufacturing a plated article using the composition. The composition contains an acid generator, a resin, and a sulfur-containing compound including a sulfur-containing compound and a thiol compound that is different from the sulfur-containing compound.
H2-Antihistaminika, 18. Mitt. 5,6-Alkylsubstituierte 4-Pyrimidinone mit H2-antihistaminischer Wirkung
作者:Jan-Peter Spengler、Walter Schunack
DOI:10.1002/ardp.19843170509
日期:——
5,6‐Alkylsubstituierte 2‐2‐[(5‐Methyl‐4‐imidazolyl)‐methylthio]‐ethylamino}‐4‐pyrimidinone wurden dargestellt und auf ihre H2‐antihistaminische Wirksamkeit untersucht.