A composition for film formation which comprises:
(A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one compound selected from the group consisting of
(A-1) compounds represented by the following formula (1)
R
a
Si(OR
1
)
4-a
(1)
(A-2) compounds represented by the following formula (2)
Si(OR
2
)
4
(2)
and
(A-3) compounds represented by the following formula (3)
R
3
b
(R
4
O)
3-b
Si—(R
7
)
d
—Si(OR
5
)
3-c
R
6
c
(3)
(B) at least one member selected from the group consisting of compounds of the metals in Groups IA and IIA of the periodic table; and
(C) an organic solvent.
A method for film formation using the composition and a silica-based film obtained by the method are also disclosed.
一种用于成膜的组合物,它包括
(A) 通过
水解和缩合至少一种选自以下组别的化合物而得到的
水解和缩合产物
(A-1) 下式(1)所代表的化合物
R
a
Si(OR
1
)
4-a
(1)
(A-2) 下式(2)所代表的化合物
Si(OR
2
)
4
(2)
和
(A-3) 下式(3)所代表的化合物
R
3
b
(R
4
O)
3-b
Si-(R
7
)
d
-Si(OR
5
)
3-c
R
6
c
(3)
(B) 至少一个选自元素周期表 IA 和 IIA 族
金属化合物的成员;以及
(C) 有机溶剂。
此外,还公开了一种使用该组合物形成薄膜的方法以及通过该方法获得的
硅基薄膜。