2-tert.-Butyl-4,4-dimethyl-pentansaeure-methylester | 33712-50-4

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 2-tert.-Butyl-4,4-dimethyl-pentansaeure-methylester
• 英文别名: Methyl 2-tert-butyl-4,4-dimethylpentanoate
• CAS: 33712-50-4
• 化学式: C₁₂H₂₄O₂
• 分子量: 200.321
• InChiKey: MAPDEMMMPHNRTK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  14
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  3-bromo-2,2,6,6-tetramethyl-heptan-4-one 在 potassium tert-butylate 作用下， 生成 2-tert.-Butyl-4,4-dimethyl-pentansaeure-methylester
  参考文献：
  名称：

  Stereochemistry of opening of cyclopropanols. trans-2,3-Di-tert-butylcyclopropanone hemiketals

  摘要：

  DOI：

  10.1021/jo00977a011

文献信息

• HYDROPHILIC MEMBER, FIN MEMBER, ALUMINUM FIN MEMBER, HEAT EXCHANGER AND AIR CONDITIONER
  申请人：FUJIFILM Corporation

  公开号：EP2269817A1

  公开（公告）日：2011-01-05

  A hydrophilic member endowed with sufficient hydrophilicity and excellent in the water resistance, antifouling property and scratch resistance can be provided, which is a hydrophilic member comprising a base material having provided thereon a hydrophilic film formed from a hydrophilic composition containing (A-1) a hydrophilic polymer having at least one hydrolyzable alkoxysilyl group on the polymer side chain and (B) a metal complex catalyst, wherein the water swelling degree of the hydrophilic film is 1.5 times or less.

  可以提供一种具有足够亲水性和优异的耐水性、防污性和抗划伤性的亲水构件，该亲水构件由基材组成，基材上有一层亲水膜，该亲水膜由亲水组合物形成，该亲水组合物含有 (A-1) 亲水性聚合物，聚合物侧链上至少有一个可水解的烷氧基硅烷基，以及 (B) 金属络合催化剂，其中亲水膜的水膨胀度为 1.5 倍或更低。
• Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition
  申请人：FUJIFILM Corporation

  公开号：EP1536285B1

  公开（公告）日：2016-01-06
• Aqueous colorant dispersion, production method of aqueous colorant dispersion, and aqueous ink for inkjet recording
  申请人：FUJIFILM Corporation

  公开号：EP2096150B1

  公开（公告）日：2014-02-12
• POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
  申请人：Kato Takayuki

  公开号：US20100203451A1

  公开（公告）日：2010-08-12

  Provided is a positive resist composition using a resin having, in the polymer main chain, a specific acid decomposable structure and further having, in the side chain thereof, several specific acid decomposable groups, satisfactory in an exposure latitude, a focus latitude, and pattern collapse prevention at a high level, and having reduced development defects; and a pattern forming method.
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME
  申请人：HIRANO Shuji

  公开号：US20120003590A1

  公开（公告）日：2012-01-05

  An actinic ray-sensitive or radiation-sensitive resin composition containing a resin having (A) a repeating unit represented by a specific formula (I) and (B) a repeating unit capable of generating an acid upon irradiation with an actinic ray or radiation.