申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20020072579A1
公开(公告)日:2002-06-13
Tertiary alcohol compounds of formula (1) are novel wherein R
1
and R
2
are C1-10 alkyl groups which may have halogen substituents, or R
1
and R
2
may form an aliphatic hydrocarbon ring, Y and Z are a single bond or a divalent C1-10 organic group, and k=0 or 1. Using the tertiary alcohol compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, etching resistance and substrate adhesion.
1
公式(1)的三级醇化合物是新颖的,其中R1和R2是C1-10烷基,可能具有卤素取代基,或者R1和R2可以形成脂肪族碳氢化合物环,Y和Z是单键或双价的C1-10有机基团,k=0或1。使用三级醇化合物作为单体,得到聚合物。包含该聚合物作为基础树脂的抗蚀剂组合物对高能辐射敏感,并具有优异的敏感性、分辨率、蚀刻抗性和基底附着性。