PATTERNING PROCESS, RESIST COMPOSITION, POLYMER, AND POLYMERIZABLE ESTER COMPOUND
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20130157194A1
公开(公告)日:2013-06-20
A negative pattern is formed by applying a resist composition onto a substrate, prebaking, exposing to high-energy radiation, baking (PEB), and developing the exposed resist film in an organic solvent developer to dissolve the unexposed region of resist film. The resist composition comprising a polymer adapted to form a lactone ring under the action of an acid so that the polymer may reduce its solubility in an organic solvent developer, an acid generator, and an organic solvent displays a high dissolution contrast between the unexposed region of promoted dissolution and the exposed region of inhibited dissolution.
US9057949B2
申请人:——
公开号:US9057949B2
公开(公告)日:2015-06-16
Nonlinear optical side-chain polymers post-functionalized with high-β chromophores exhibiting large electro-optic property
Electro‐optic side‐chain polymers have been synthesized by the post‐functionalization of methacrylate isocyanate polymers with novel phenyl vinylene thiophene vinylene bridge (FTC) nonlinearopticalchromophores. For this application, FTC‐based chromophores were modified in their electronic donor structure, exhibiting much larger molecular hyperpolarizabilities compared with the benchmark FTC. Of these