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9-(3-methoxyphenyl)thioxanthenol | 52797-61-2

中文名称
——
中文别名
——
英文名称
9-(3-methoxyphenyl)thioxanthenol
英文别名
9-(3-Methoxyphenyl)thioxanthen-9-ol
9-(3-methoxyphenyl)thioxanthenol化学式
CAS
52797-61-2
化学式
C20H16O2S
mdl
——
分子量
320.412
InChiKey
FFBRAMLVWTWZGC-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4.3
  • 重原子数:
    23
  • 可旋转键数:
    2
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.1
  • 拓扑面积:
    54.8
  • 氢给体数:
    1
  • 氢受体数:
    3

反应信息

  • 作为反应物:
    描述:
    9-(3-methoxyphenyl)thioxanthenol三甲基氯硅烷 作用下, 以 二氯甲烷二甲基亚砜 为溶剂, 反应 12.0h, 生成 9-Chloro-9-(3-methoxy-phenyl)-9H-thioxanthene
    参考文献:
    名称:
    S-Pixyl Analogues as Photocleavable Protecting Groups for Nucleosides
    摘要:
    Several analogues of the 9-phenylthioxanthyl (S-pixyl) photocleavable protecting group have been synthesized, containing substituents on the 9-aryl ring and on the thioxanthyl backbone. Each analogue protected the 5'-hydroxy moiety of thymidine in good to excellent yield. The protected substrates were deprotected in 1:1 water: acetonitrile with irradiation at 300 nm, resulting in recovered thymidine in excellent yield, except for the nitro-substituted analogues which gave substantially lower yields. Substrates with 2,7-dibromo or 3-methoxy substitution on the thioxanthyl backbone were also deprotected efficiently with irradiation at 350 nm. Shorter irradiation times were observed in the less nucleophilic solvent mixture of 1:9 trifluoroethanol:acetonitrile, with no formation of secondary photooxidation products. Photodeprotection with high yields was also achieved in the absence of solvent, with no secondary photoproducts.
    DOI:
    10.1021/jo026009w
  • 作为产物:
    描述:
    9-噻吨酮间溴苯甲醚magnesium1,2-二溴乙烷 作用下, 以 四氢呋喃 为溶剂, 反应 3.0h, 以70%的产率得到9-(3-methoxyphenyl)thioxanthenol
    参考文献:
    名称:
    S-Pixyl Analogues as Photocleavable Protecting Groups for Nucleosides
    摘要:
    Several analogues of the 9-phenylthioxanthyl (S-pixyl) photocleavable protecting group have been synthesized, containing substituents on the 9-aryl ring and on the thioxanthyl backbone. Each analogue protected the 5'-hydroxy moiety of thymidine in good to excellent yield. The protected substrates were deprotected in 1:1 water: acetonitrile with irradiation at 300 nm, resulting in recovered thymidine in excellent yield, except for the nitro-substituted analogues which gave substantially lower yields. Substrates with 2,7-dibromo or 3-methoxy substitution on the thioxanthyl backbone were also deprotected efficiently with irradiation at 350 nm. Shorter irradiation times were observed in the less nucleophilic solvent mixture of 1:9 trifluoroethanol:acetonitrile, with no formation of secondary photooxidation products. Photodeprotection with high yields was also achieved in the absence of solvent, with no secondary photoproducts.
    DOI:
    10.1021/jo026009w
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文献信息

  • NAGAO;YUKINORI;ABE, YUKIHIRO;OYAMA, TSUKASA;ABE, YOSHIMOTO;MISONO, TAKAHI+, J. CHEM. SOC. JAP., CHEM. AND IND. CHEM.,(1987) N 10, 1839-1845
    作者:NAGAO、YUKINORI、ABE, YUKIHIRO、OYAMA, TSUKASA、ABE, YOSHIMOTO、MISONO, TAKAHI+
    DOI:——
    日期:——
  • S-Pixyl Analogues as Photocleavable Protecting Groups for Nucleosides
    作者:Michael P. Coleman、Mary K. Boyd
    DOI:10.1021/jo026009w
    日期:2002.11.1
    Several analogues of the 9-phenylthioxanthyl (S-pixyl) photocleavable protecting group have been synthesized, containing substituents on the 9-aryl ring and on the thioxanthyl backbone. Each analogue protected the 5'-hydroxy moiety of thymidine in good to excellent yield. The protected substrates were deprotected in 1:1 water: acetonitrile with irradiation at 300 nm, resulting in recovered thymidine in excellent yield, except for the nitro-substituted analogues which gave substantially lower yields. Substrates with 2,7-dibromo or 3-methoxy substitution on the thioxanthyl backbone were also deprotected efficiently with irradiation at 350 nm. Shorter irradiation times were observed in the less nucleophilic solvent mixture of 1:9 trifluoroethanol:acetonitrile, with no formation of secondary photooxidation products. Photodeprotection with high yields was also achieved in the absence of solvent, with no secondary photoproducts.
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