3-Ethoxy-3-oxopropyl 2-methylprop-2-enoate | 76402-21-6

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 3-Ethoxy-3-oxopropyl 2-methylprop-2-enoate
• 英文别名: (3-ethoxy-3-oxopropyl) 2-methylprop-2-enoate
• CAS: 76402-21-6
• 化学式: C₉H₁₄O₄
• 分子量: 186.2
• InChiKey: XAMQPFZVAQFLEK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  13
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.56
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• POLYMERIZABLE LIQUID CRYSTAL COMPOUND, POLYMERIZABLE LIQUID CRYSTAL COMPOSITION, LIQUID CRYSTALLINE POLYMER, AND OPTICAL ANISOTROPIC ARTICLE
  申请人：Sakamoto Kei

  公开号：US20100258764A1

  公开（公告）日：2010-10-14

  A polymerizable liquid crystal compound shown by the following formula (I), a polymerizable liquid crystal composition that includes the polymerizable liquid crystal compound and a chiral compound polymerizable with the polymerizable liquid crystal compound, a liquid crystalline polymer obtained by polymerizing the polymerizable liquid crystal compound or the polymerizable liquid crystal composition, and an optical anisotropic article that includes the liquid crystalline polymer. The polymerizable liquid crystal compound shows a liquid crystal phase over a wider temperature range, is chemically stable, can be inexpensively produced, and has a wide selective reflection wavelength band Δλ (i.e., a large value Δn). The polymerizable liquid crystal composition includes the polymerizable liquid crystal compound, the liquid crystalline polymer is obtained by polymerizing the polymerizable liquid crystal compound or the polymerizable liquid crystal composition, and the optical anisotropic article includes the liquid crystalline polymer. wherein Y 1 to Y 6 represent —O—, —O—C(═O)—, —C(═O)—O—, or the like, G 1 and G 2 represent divalent aliphatic groups having 1 to 20 carbon atoms, Z 1 and Z 2 represent an alkenyl group having 2 to 10 carbon atoms or the like, A 1 and A 2 represent divalent organic groups A having 1 to 30 carbon atoms, X 1 to X 8 represent a hydrogen atom or the like, and a and b represent 0 or 1.
• RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND
  申请人：Shiono Daiju

  公开号：US20120077125A1

  公开（公告）日：2012-03-29

  A resist composition for immersion exposure, including a base component that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component that generates acid upon exposure, and a fluorine-containing compound represented by a general formula (c-1) that is decomposable in an alkali developing solution: wherein R 1 represents an organic group which may contain a polymerizable group, with the proviso that said polymerizable group has a carbon-carbon multiple bond, and the carbon atoms forming the multiple bond are not directly bonded to the carbon atom within the —C(═O)— group in general formula (c-1); and R 2 represents an organic group having a fluorine atom.
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  公开号：US4426481A

  公开（公告）日：1984-01-17
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  申请人：——

  公开号：US8158021B2

  公开（公告）日：2012-04-17
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  申请人：——

  公开号：US8642244B2

  公开（公告）日：2014-02-04