4-Oktylmorpholin-N-oxid | 67046-08-6

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 恶嗪烷类
• 英文名称: 4-Oktylmorpholin-N-oxid
• 英文别名: 4-octyl-morpholine 4-oxide；4-Octyl-4-oxo-1,4lambda~5~-oxazinane；4-octyl-4-oxidomorpholin-4-ium
• CAS: 67046-08-6
• 化学式: C₁₂H₂₅NO₂
• 分子量: 215.336
• InChiKey: BGOJJTMQQAKVNB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  15
• 可旋转键数：
  7
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  27.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  4-辛基吗啉 、 双氧水 以92%的产率得到
  参考文献：
  名称：

  DEVINSKY F.; JACKO I.; NAGY A.; KRASNEC L., CHEM. ZVESTI, 1978, 32, NO 1, 106-115

  摘要：

  DOI：

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND RESIST FILM USING THE COMPOSITION, AND ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE USING THESE
  申请人：FUJIFILM CORPORATION

  公开号：US20140349221A1

  公开（公告）日：2014-11-27

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound capable of generating an acid upon irradiation with an actinic ray or radiation, represented by the formula (Z1), and the formula (Z1) is defined as herein, and a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method comprising a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, a step of exposing the film, and a step of developing the exposed film, a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the method for manufacturing an electronic device.