A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt.
In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.
以下公式(1)所表示的
磺酸盐阳离子可作为优秀的辐射敏化酸发生剂,用于光阻组分。使用含有此
磺酸盐阳离子的光阻组分可以形成良好的图案。在公式(1)中,R1代表一价有机基团,Q+代表
磺酸盐阳离子或
碘酸盐阳离子。