申请人:Fujisawa Pharmaceutical Co., Ltd.
公开号:US04861769A1
公开(公告)日:1989-08-29
A compound of the formula: ##STR1## wherein R.sup.1 is lower alkyl, lower alkanoyl, aryl, ar(lower)alkyl or a heterocyclic group, each of which may have suitable substituent(s), R.sup.2 is carboxy or protected carboxy, R.sup.3 is hydrogen, halogen, hydroxy, lower alkoxy, acyloxy, lower alkylthio, lower alkenyl, lower alkenylthio, lower alkynyl, heterocyclicthio or a heterocyclic group, in which lower alkylthio, lower alkenyl, lower alkenylthio, heterocyclicthio and a heterocyclic group may have suitable substituent(s), R.sup.4 and R.sup.5 are each hydrogen, halogen or arylthio, A is lower alkylene, and n is an integer of 0 or 1, and a pharmaceutically acceptable salt thereof, processes for preparation thereof and pharmaceutical composition comprising the same.
一种化合物的公式:##STR1## 其中R.sup.1是低烷基、低烷酰基、芳香族、芳香族(低)烷基或杂环基,每个基团都可以有适当的取代基,R.sup.2是羧基或保护羧基,R.sup.3是氢、卤素、羟基、低烷氧基、酰氧基、低烷基硫基、低烯基、低烯基硫基、低炔基、杂环硫基或杂环基,在其中低烷基硫基、低烯基、低烯基硫基、杂环硫基和杂环基可以具有适当的取代基,R.sup.4和R.sup.5分别是氢、卤素或芳基硫基,A是低烷基亚烷基,n是0或1的整数,以及其药学上可接受的盐,其制备过程和包含该化合物的药物组合物。