Butyric acid methoxycarbonylmethyl ester | 104555-64-8

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: Butyric acid methoxycarbonylmethyl ester
• 英文别名: (2-Methoxy-2-oxoethyl) butanoate
• CAS: 104555-64-8
• 化学式: C₇H₁₂O₄
• 分子量: 160.17
• InChiKey: GBGHJNCEYUHHOM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.9
• 重原子数：
  11
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.71
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  甲基乙酰基乙基氧基乙酸酯 、 乙烯 、 二叔丁基过氧化物 生成 Butyric acid methoxycarbonylmethyl ester
  参考文献：
  名称：

  IKONNIKOV, N. S.;LAMOVA, N. I.;TERENTEV, A. B., IZV. AN CCCP. CEP. XIM., 1985, N 10, 2387-2392

  摘要：

  DOI：

文献信息

• [EN] METHODS OF TREATING A SUBJECT AND RELATED PARTICLES, POLYMERS AND COMPOSITIONS<br/>[FR] MÉTHODES DE TRAITEMENT D'UN SUJET ET PARTICULES, POLYMÈRES ET COMPOSITIONS À CET EFFET
  申请人：FETZER OLIVER S

  公开号：WO2012044832A1

  公开（公告）日：2012-04-05

  Described herein are methods for treating a subject with combinations of polymer-agent particles and cyclodextrin polymer agent conjugates. The methods herein may be used to treat subjects identified with cancer, cardiovascular disorders, autoimmune disorders, or inflammatory disorders. Also described herein are compositions, dosage forms, and kits comprising polymer-agent particles and cyclodextrin polymer agent conjugates.

  本文描述了一种利用聚合物-药剂颗粒和环糊精聚合物药剂共轭物组合治疗受试者的方法。本文中的方法可用于治疗被诊断患有癌症、心血管疾病、自身免疫性疾病或炎症性疾病的受试者。本文还描述了包含聚合物-药剂颗粒和环糊精聚合物药剂共轭物的组合物、剂型和配套工具。
• Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device
  申请人：FUJIFILM Corporation

  公开号：US10031419B2

  公开（公告）日：2018-07-24

  There is provided a pattern forming method comprising (i) forming a film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a resin which decomposes due to an action of an acid to change its solubility with respect to a developer and (C) a specific resin, (ii) forming a top coat layer using a top coat composition which contains a resin (T) on the film, (iii) exposing the film which has the top coat layer to actinic rays or radiation, and (iv) forming a pattern by developing the film which has the top coat layer after the exposing.

  本发明提供了一种图案形成方法，包括(i)使用感光树脂组合物或辐射敏感树脂组合物在基底上形成胶片，该组合物包含(A)由于酸的作用而分解，从而改变其相对于显影剂的溶解度的树脂和(C)特定树脂、(ii) 使用含有树脂 (T) 的表层组合物在胶片上形成表层，(iii) 将具有表层的胶片暴露于放 射线或辐射，(iv) 在暴露后对具有表层的胶片进行显影，形成图案。
• Ethylene telomerization by methyl acetoxyacetate
  作者：N. S. Ikonnikov、N. I. Lamova、A. B. Terent'ev

  DOI：10.1007/bf00963265

  日期：1985.10
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN
  申请人：FUJIFILM CORPORATION

  公开号：US20140227636A1

  公开（公告）日：2014-08-14

  Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (Aa) containing at least one repeating unit (Aa1) derived from monomers of general formula (aa1-1) below and at least one repeating unit (Aa2) derived from monomers of general formula (aa2-1) below and comprising a resin (Ab) that when acted on by an acid, changes its alkali solubility.
• PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THESE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20160048075A1

  公开（公告）日：2016-02-18

  There is provided a pattern forming method comprising (i) forming a film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a resin which decomposes due to an action of an acid to change its solubility with respect to a developer and (C) a specific resin, (ii) forming a top coat layer using a top coat composition which contains a resin (T) on the film, (iii) exposing the film which has the top coat layer to actinic rays or radiation, and (iv) forming a pattern by developing the film which has the top coat layer after the exposing.