α,α,α-trifluoromethacrylic acid anhydride | 158140-23-9

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: α,α,α-trifluoromethacrylic acid anhydride
• 英文别名: 2-(Trifluoromethyl)prop-2-enoyl 2-(trifluoromethyl)prop-2-enoate；2-(trifluoromethyl)prop-2-enoyl 2-(trifluoromethyl)prop-2-enoate
• CAS: 158140-23-9
• 化学式: C₈H₄F₆O₃
• 分子量: 262.108
• InChiKey: PJUVXNPXFGXROA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  17
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  43.4
• 氢给体数：
  0
• 氢受体数：
  9

反应信息

• 作为产物：
  描述：

  2-(三氟甲基)丙烯酸 在 氯化亚砜 作用下， 反应 5.0h， 以53%的产率得到2-(trifluoromethyl)acrylic chloride
  参考文献：
  名称：

  Optically active fluorine-containing compounds and processes for their production

  摘要：

  由以下公式（1）或（2）表示的具有光学活性的含氟化合物，其中A是氧原子、硫原子或NH基团，R1选自各种有机基团，用于制备（S）-或（R）-3,3,3-三氟-2-羟基-2-甲基丙酸。

  公开号：

  EP1422226A1

文献信息

• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20150322027A1

  公开（公告）日：2015-11-12

  A monomer (1) is prepared by reacting a compound (9) with a base or metal to form a metal enolate reagent, and reacting the metal enolate reagent with an acyloxyketone compound (8). A polymer derived from the monomer is used as base resin to formulate a resist composition, which is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness in forming positive pattern via alkaline development and in forming negative pattern via organic solvent development.

  一种单体（1）是通过将一种化合物（9）与碱或金属反应形成金属烯醇盐试剂，然后将金属烯醇盐试剂与一种酰氧基酮化合物（8）反应而制备的。由该单体派生出的聚合物用作基础树脂，以配制一种光刻胶组合物，该组合物在常温下稳定，显示出高溶解对比度、控制的酸性扩散和在碱性显影形成正图案以及有机溶剂显影形成负图案时低粗糙度。
• ACRYLATE ESTER DERIVATIVES AND POLYMER COMPOUNDS
  申请人：NAKAYAMA Osamu

  公开号：US20120316349A1

  公开（公告）日：2012-12-13

  A cyclic alcohol of formula (II-1): wherein: R 2 , R 3 , and R 4 are each independently a hydrogen atom, a linear alkyl group comprising 1 to 6 carbon atoms, a branched alkyl group comprising 3 to 6 carbon atoms, or a cyclic alkyl group comprising 3 to 6 carbon atoms; or R 2 and R 3 or R 3 and R 4 combine to form an alkylene group comprising 3 to 6 carbon atoms; m is 1 or 2; R 5 , R 6 , R 7 , R 8 , R 9 , and R 10 are each independently a hydrogen atom, a linear alkyl group comprising 1 to 6 carbon atoms, a branched alkyl group comprising 3 to 6 carbon atoms, or a cyclic alkyl group comprising 3 to 6 carbon atoms; A is an oxygen atom; and B is an oxygen atom or a sulfur atom. In addition, a process for producing the cyclic alcohol of formula (II-1).

  一种化学式为(II-1)的环状醇：其中：R2、R3和R4分别独立地是氢原子、由1至6个碳原子组成的直链烷基基团、由3至6个碳原子组成的支链烷基基团或由3至6个碳原子组成的环状烷基基团；或者R2和R3或R3和R4结合形成由3至6个碳原子组成的亚烯基基团；m为1或2；R5、R6、R7、R8、R9和R10分别独立地是氢原子、由1至6个碳原子组成的直链烷基基团、由3至6个碳原子组成的支链烷基基团或由3至6个碳原子组成的环状烷基基团；A为氧原子；B为氧原子或硫原子。此外，一种制备化学式(II-1)的环状醇的方法。
• ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Kinsho Takeshi

  公开号：US20100304295A1

  公开（公告）日：2010-12-02

  An acid-labile ester monomer of spirocyclic structure has formula (1) wherein Z is a monovalent group having a polymerizable double bond, X is a divalent group which forms a cyclopentane, cyclohexane or norbornane ring, R 2 is H or monovalent hydrocarbon, R 3 and R 4 are H or monovalent hydrocarbon, or R 3 and R 4 , taken together, stand for a divalent group which forms a cyclopentane or cyclohexane ring, and n is 1 or 2. A polymer obtained from the acid-labile ester monomer has so high reactivity in acid-catalyzed elimination reaction that the polymer may be used to formulate a resist composition having high resolution.

  一种酸敏感酯单体具有螺环结构，其化学式如下（1），其中Z是具有可聚合双键的一价基团，X是形成环戊烷、环己烷或诺邦烷环的二价基团，R2是H或一价碳氢基团，R3和R4是H或一价碳氢基团，或者R3和R4一起表示形成环戊烷或环己烷环的二价基团，n为1或2。从酸敏感酯单体获得的聚合物在酸催化消除反应中具有很高的反应性，因此可以用于制备具有高分辨率的抗蚀组合物。
• CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS
  申请人：Ohsawa Youichi

  公开号：US20130034813A1

  公开（公告）日：2013-02-07

  A chemically amplified positive resist composition comprising (A) a sulfonium salt of 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylpropionic acid, (B) an acid generator, (C) a base resin, and (D) an organic solvent is suited for ArF immersion lithography. The carboxylic acid sulfonium salt is highly hydrophobic and little leached out in immersion water. By virtue of controlled acid diffusion, a pattern profile with high resolution can be constructed.

  一种化学增感正型光刻胶组合物，包括（A）三氟甲基-3,3,3-三氟-2-羟基-2-丙酸磺酸盐，（B）酸发生剂，（C）碱性树脂和（D）有机溶剂，适用于ArF浸没光刻。羧酸磺酸盐具有高度疏水性，在浸没水中几乎不溶出。通过控制酸扩散，可以构建具有高分辨率的图案轮廓。
• POLYMERIZABLE FLUORINATED ESTER COMPOUNDS AND THEIR PREPARING PROCESSES
  申请人：Kinsho Takeshi

  公开号：US20070249858A1

  公开（公告）日：2007-10-25

  Polymerizable fluorinated ester compounds having formulae (1) and (2) are novel wherein R 1 is H, methyl or trifluoromethyl, R 2 and R 3 are H or a monovalent hydrocarbon group, R 2 and R 3 may form a ring, R 4 is H, OH or a monovalent hydrocarbon group, and R 5 is an acid labile group. They are useful as monomers to produce polymers for the manufacture of radiation-sensitive resist compositions which have high transparency to radiation having a wavelength of up to 500 nm and exhibit good development properties due to the presence of phenol-like acidic hydroxyl groups.

  具有以下化学式（1）和（2）的可聚合氟化酯化合物是一种新颖化合物，其中R1为H、甲基或三氟甲基，R2和R3为H或一价碳氢基团，R2和R3可能形成环，R4为H、OH或一价碳氢基团，R5为酸不稳定基团。它们可用作单体，用于生产用于制造对波长高达500纳米的辐射具有高透明度并由于存在酚类酸性羟基团而表现出良好的显影性能的辐射敏感型抗蚀组合物的聚合物。