申请人:Oji Holdings Corporation
公开号:US20200048491A1
公开(公告)日:2020-02-13
It is an object of the present invention to provide a pattern forming method capable of easily forming a phase-separated structure with high accuracy, even in the case of widening the applicable range of a pattern size. The present invention relates to a pattern forming method comprising: applying an under coating agent onto a substrate, and applying a self-assembly composition for pattern formation to the surface of the substrate, onto which the under coating agent has been applied, and then forming a self-assembly film according to self-assembly phase separation, wherein the self-assembly composition for pattern formation comprises a block copolymer comprising a polymerization unit (a) having at least one selected from a structure represented by a formula (
103
) and a structure represented by a formula (
104
), and a polymerization unit (b) having a structure represented by a formula (
105
).
本发明的目的是提供一种能够在扩大图案尺寸适用范围的情况下,轻松形成具有高精度的相分离结构的图案形成方法。本发明涉及一种图案形成方法,包括:在基板上涂覆底涂剂,并将用于图案形成的自组装组合物应用到已涂覆底涂剂的基板表面上,然后根据自组装相分离形成自组装膜,其中用于图案形成的自组装组合物包括一种嵌段共聚物,该嵌段共聚物包括至少具有下列结构之一的聚合单元(a)和具有下列结构的聚合单元(b)。