tricycle[3.2.1.0*2,4*]oct-6-ene-3-carboxylic acid ethyl ester | 56499-27-5

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: tricycle[3.2.1.0*2,4*]oct-6-ene-3-carboxylic acid ethyl ester
• 英文别名: Methyl tricyclo[3.2.1.02,4]oct-6-ene-3-carboxylate
• CAS: 56499-27-5
• 化学式: C₁₀H₁₂O₂
• 分子量: 164.204
• InChiKey: KVLVAPAIVFMWHE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.7
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  4-amino-6-(4-iodophenyl)-7,8-dihydropyrimido[5,4-f][1,4]oxazepin-5(6H)-one 、 tricycle[3.2.1.0*2,4*]oct-6-ene-3-carboxylic acid ethyl ester 在 双(乙腈)氯化钯(II) 哌啶 、 甲酸 、 四丁基碘化铵 作用下， 以 N,N-二甲基甲酰胺 为溶剂， 反应 16.0h， 生成 (1R,5R,6S)-6-[4-(4-amino-5-oxo-7,8-dihydro-5H-9-oxa-1,3,6-triaza-benzocyclohepten-6-yl)-phenyl]-tricyclo[3.2.1.0*2.4*]octane-3-carboxylic acid methyl ester
  参考文献：
  名称：

  SUBSTITUTED BICYCLOLACTAM COMPOUNDS

  摘要：

  该发明提供了式（1）的化合物及其药用盐，其中R1、R2、R3、R4、R5a、R5b、R5c、R5d、Q、A、Z和R7如本文所述；以及其组合物和用途。

  公开号：

  US20090036425A1

文献信息

• HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES
  申请人：De Binod B.

  公开号：US20080206667A1

  公开（公告）日：2008-08-28

  An etch resistant thermally curable Underlayer for use in a multiplayer liyhographic process to produce a photolithographic bilayer coated substrate, the composition having: (a) at least one cycloolefin polymer comprising at least one repeating unit of Structure (I), and at least one repeating unit of Structure (II), and optionally at least one repeating unit of Structure (III) with the proviso that neither Structure (I) nor Structure (II) nor Structure (III) contains acid sensitive groups. b) at least one cross-linking agent selected from the group consisting of an amino or phenolic cross-linking agent; c) a least one thermal acid generator (TAG); d) at lest one solvent; and e) optionally, at least one surfactant.
• THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION
  申请人：De Binod B.

  公开号：US20120178871A1

  公开（公告）日：2012-07-12

  An etch resistant thermally curable Underlayer composition for use in a multiplayer lithographic process for producing a photolithographic bilayer coated substrate, the composirion being a composition of: (a) a polymer comprising repeating units of Structure I, II and III (b) at least one crosslinking agent; (c) at least one thermal acid generator; and (d) at least one solvent.
• [EN] HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES<br/>[FR] COMPOSITIONS POUR SOUS-COUCHES EXTRÊMEMENT RÉSISTANTES À LA CORROSION POUR PROCÉDÉS LITHOGRAPHIQUES MULTICOUCHES
  申请人：FUJIFILM ELECTRONIC MATERIALS

  公开号：WO2008140846A1

  公开（公告）日：2008-11-20

  [EN] An etch resistant thermally curable Underlayer for use in a multiplayer liyhographic process to produce a photolithographic bilayer coated substrate, the composition having: (a) at least one cycloolefin polymer comprising at least one repeating unit of Structure (I), and at least one repeating unit of Structure (II), and optionally at least one repeating unit of Structure (III) with the proviso that neither Structure (I) nor Structure (II) nor Structure (III) contains acid sensitive groups. b) at least one cross-linking agent selected from the group consisting of an amino or phenolic cross-linking agent; c) a least one thermal acid generator (TAG); d) at lest one solvent; and e) optionally, at least one surfactant.
  [FR] Cette invention a trait à une sous-couche vulcanisable par voie thermique résistante à la corrosion à utiliser dans un procédé lithographique multicouche pour produire un substrat recouvert d'une double couche photolithographique, ladite composition comportant : (a) au moins un polymère cyclooléfinique comportant au moins une unité répétée de structure (I), et au moins une unité répétée de structure (II), et éventuellement au moins une unité répétée de structure (III), à condition que ni la structure (I), ni la structure (II), ni la structure (III) ne contient de groupes sensibles à l'acide ; b) au moins un agent de réticulation choisi parmi le groupe constitué par un agent de réticulation amino ou phénolique ; c) au moins un générateur d'acide thermique ; d) au moins un solvant ; et e) éventuellement au moins un tensioactif.
• SUBSTITUTED BICYCLOLACTAM COMPOUNDS
  申请人：Dow Robert L.

  公开号：US20090036425A1

  公开（公告）日：2009-02-05

  The invention provides compounds of formula (1), and the pharmaceutically acceptable salt thereof, wherein R 1 , R 2 , R 3 , R 4 , R 5a , R 5b , R 5c , R 5d , Q, A, Z, and R 7 are as described herein; compositions thereof; and uses thereof.

  该发明提供了式（1）的化合物及其药用盐，其中R1、R2、R3、R4、R5a、R5b、R5c、R5d、Q、A、Z和R7如本文所述；以及其组合物和用途。