申请人:Centre International de Recherches Dermatologiques Galderma (CIRD
公开号:US05446059A1
公开(公告)日:1995-08-29
Benzimidazole derivatives having general formula (I), wherein R.sub.1 and R.sub.2 are a hydrogen atom, a lower alkyl radical, an OR.sub.4 radical, a lower fluoroalkyl radical or a halogen atom; R.sub.3 is a hydrogen atom, a lower alkyl radical, a halogen, a hydroxyl or a lower alkoxy radical having 1-6 carbon atoms; R.sub.4 is a hydrogen atom, a lower alkyl radical, a benzyl radical or a (II) radical, PO.sub.3 H, SO.sub.3 H or an aminoacid residue; R.sub.7 is a lower alkyl radical, a lower alkoxy radical having 1-6 carbon atoms, a --(CH.sub.2).sub.n --COOH radical where n=1-6, or the radical (III), where r' and r" are a hydrogen atom or a lower alkyl radical, or form, together with the nitrogen atom, a 5 or 6-membered heterocyclic ring optionally interrupted by a heteroatom; R.sub.5 and R.sub.6 are different and represent the OR.sub.8 radical or a mono or polycyclic cycloalkyl radical having 5-12 carbon atoms bound to the phenyl core by a tertiary carbon; R.sub.8 is a hydrogen atom, a lower alkyl radical, an acyl radical having 2-7 carbon atoms, a benzyl radical optionally substituted by one or more halogen atoms, or a benzoyl radical; and salts of said compounds obtained by adding a pharmaceutically acceptable acid or base. Said compounds may be used therapeutically, in particular in relation to inflammatory and/or immunoallergic conditions, and cosmetically to provide body and hair care.
通式(I)的苯并咪唑衍生物,其中R.sub.1和R.sub.2是氢原子,较低的烷基基团,OR.sub.4基团,较低的氟烷基基团或卤素原子;R.sub.3是氢原子,较低的烷基基团,卤素,羟基或具有1-6个碳原子的较低烷氧基基团;R.sub.4是氢原子,较低的烷基基团,苄基基团或(II)基团,PO.sub.3 H,SO.sub.3 H或氨基酸残基;R.sub.7是较低的烷基基团,具有1-6个碳原子的较低烷氧基基团,--(CH.sub.2).sub.n--COOH基团,其中n = 1-6,或基团(III),其中r'和r"是氢原子或较低的烷基基团,或与氮原子一起形成5或6元杂环环,可选地由杂原子中断;R.sub.5和R.sub.6不同,表示OR.sub.8基团或由第三级碳原子与苯环结合的具有5-12个碳原子的单环或多环环烷基基团;R.sub.8是氢原子,较低的烷基基团,具有2-7个碳原子的酰基基团,苄基基团,可选地被一个或多个卤素原子取代,或苯甲酰基基团;以及通过添加药学上可接受的酸或碱所获得的该化合物的盐。该化合物可以在治疗上使用,特别是与炎症和/或免疫过敏状况有关,并且可以在美容上用于提供身体和头发护理。