New hafnocene triarylstannyl complexes were prepared and were shown to undergo clean thermal decompositions via α-aryl-elimination to produce the corresponding stannylene and a hafnocene aryl complex. The rate of the decomposition is highly dependent on the nature of the ancillary ligand, with the stabilities of the CpCp*Hf(SnPh3)X compounds following the order X = NMe2 > Np (α-agostic) > OMe > Cl
制备了新的
铪三芳基
锡基配合物,并显示出通过α-芳基消除进行干净的热分解以产生相应的亚
锡基和
铪芳基配合物。分解速率高度依赖于辅助
配体的性质,CpCp*Hf(SnPh3)X 化合物的稳定性顺序为 X = NMe2 > Np (α-agostic) > OMe > Cl > Me。机理信息表明,α-芳基消除可以被视为一个协同过程,涉及迁移芳基对亲电子
金属中心的亲核攻击。