N,N-Dimethylaminomethyl-methacrylat | 28469-64-9

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: N,N-Dimethylaminomethyl-methacrylat
• 英文别名: N,N-dimethylaminomethyl methacrylate；dimethylamino-methyl methacrylate；2-Propenoic acid, 2-methyl-, (dimethylamino)methyl ester；(dimethylamino)methyl 2-methylprop-2-enoate
• CAS: 28469-64-9
• 化学式: C₇H₁₃NO₂
• 分子量: 143.186
• InChiKey: UUGXDEDGRPYWHG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  10
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.57
• 拓扑面积：
  29.5
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  N,N-Dimethylaminomethyl-methacrylat 、 溴乙酸乙酯 以 乙腈 为溶剂， 反应 18.0h， 以90%的产率得到N,N-dimethyl-N-(ethoxycarbonylmethyl)-N-[2-methylacryloyloxymethyl]ammonium bromide
  参考文献：
  名称：

  具有自我消毒和防污功能的可切换生物相容性聚合物表面。

  摘要：

  DOI：

  10.1002/anie.200803570

文献信息

• COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20160046552A1

  公开（公告）日：2016-02-18

  A composition containing a novel vinyl-group-containing compound. This composition contains a vinyl-group-containing compound represented by general formula (1). In the formula: W 1 and W 2 represent a group represented by general formula (2) (where a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or —S—, R 1 is a single bond or a C1-4 alkylene group, R 2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer equal to 0 or higher), a group represented by general formula (4) (where the ring (Z), X, R 1 , R 2 , and m are as previously stated), a hydroxyl group, or a (meth)acryloyloxy group; rings (Y 1 , Y 2 ) are aromatic hydrocarbon rings; R represents a single bond or a specific divalent group; R 3a and R 3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon group; and n1 and n2 are integers of 0-4.

  这个组合物包含一种含有新颖乙烯基团的化合物。该组合物包含一个由通式（1）表示的含有乙烯基团的化合物。在该式中：W1和W2代表由通式（2）表示的一个基团（其中环（Z）是芳香烃环，X是一个单键或—S—，R1是一个单键或C1-4烷基基团，R2是特定的取代基团，如一价碳氢化合物，m是大于或等于0的整数），一个由通式（4）表示的基团（其中环（Z）、X、R1、R2和m如前述），一个羟基，或一个（甲基）丙烯酰氧基团；环（Y1、Y2）是芳香烃环；R代表一个单键或一个特定的二价基团；R3a和R3b代表氰基、卤素原子或一价碳氢基团；n1和n2是0-4的整数。
• BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20160340374A1

  公开（公告）日：2016-11-24

  An object of the present invention is to provide a compound which is capable of attaining a composition having high storage stability without reacting with a base-reactive compound, even in the case of storage for a long period of time in a mixed state with the base-reactive compound, such as an epoxy-based compound, as well as capable of generating a strong base (guanidines, biguanides, phosphazenes or phosphoniums) by irradiation of light (active energy rays) or heating; a base generator comprising the compound; and a base-reactive composition comprising the base generator and the base-reactive compound. The present invention relates to the compound represented by the general formula (A); the base generator comprising the compound; and the base-reactive composition comprising the base generator and the base-reactive compound. (wherein R 1 represents an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; an alkenyl group; a 2-furylethynyl group; a 2-thiophenylethynyl group; or a 2,6-dithianyl group; R 2 to R 4 each independently represent an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; the aryl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; a furanyl group; a thienyl group; or an N-alkyl-substituted pyrrolyl group; Z + represents an ammonium cation having a guanidinium group, a biguanidium group or a phosphazenium group, or a phosphonium cation.)

  本发明的目的是提供一种化合物，能够在与碱反应性化合物混合状态长时间存储的情况下，仍能获得具有高储存稳定性的组合物，而不与碱反应性化合物发生反应，同时还能通过光照（活性能量射线）或加热产生强碱（胍胺、双胍胺、磷氮烷或磷銨）；包括该化合物的碱发生器；以及包括该碱发生器和碱反应性化合物的碱反应性组合物。本发明涉及由通式（A）表示的化合物；包括该化合物的碱发生器；以及包括该碱发生器和碱反应性化合物的碱反应性组合物。（其中R1代表烷基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基炔基；烯基；2-呋喃基炔基；2-噻吩基炔基；或2,6-二硫基基；R2到R4各自独立地代表烷基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基炔基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基；呋喃基；噻吩基；或N-烷基取代的吡咯基；Z+代表具有胍胺基团、双胍胺基团或磷氮烷基团的铵阳离子，或磷銨阳离子。）
• BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20160122292A1

  公开（公告）日：2016-05-05

  It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc. The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc. (wherein R 1 to R 5 each independently represent a hydrogen atom; an alkyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R 6 represents a hydrogen atom; an alkyl group which may have a substituent; an alkenyl group; an alkynyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R 7 represents a hydrogen atom; an alkyl group which may have an amino group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, and Z − represents an anion derived from a carboxylic acid having a specific structure.)

  本发明的一个目的是提供一种基发生剂，其对通用有机溶剂具有高溶解度，可以直接溶解为一种碱反应性化合物，例如基于环氧树脂的化合物，进一步具有高耐热性和低亲核性的性能，并生成强碱，包括基发生剂和碱反应性化合物的碱反应性组合物，以及生成碱的方法等。本发明涉及一种由通式（A）表示的化合物，包括该化合物的基发生剂，包括基发生剂和碱反应性化合物的碱反应性组合物，以及生成碱的方法等。（其中R1至R5各自独立地表示氢原子；烷基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，R6表示氢原子；可能具有取代基的烷基基团；烯基基团；炔基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，R7表示氢原子；可能具有氨基的烷基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，Z-表示从具有特定结构的羧酸衍生的阴离子。）
• Process for the biocidal treatment of surface
  申请人：——

  公开号：US20020090349A1

  公开（公告）日：2002-07-11

  Process for the biocidal treatment of surfaces, by applying an aqueous biocidal composition containing a biocidal agent (B), a surfactant (SA) when the said biocide is hydrophobic, and at least one water-soluble or water-dispersible organic copolymer (C) comprising at least one oligomeric or macromolecular unit (D) which can interact with the said biocide or with the micelles of surfactant(s) containing the said biocide when it is hydrophobic, and at least one hydrophilic macromolecular unit (E) which can interact with the surface to be treated and optionally with the said biocide. Use of the copolymer (C) in a biocidal composition for the treatment of surfaces, as an agent for the vectorization and/or controlled release of the said biocide onto the surface to be treated.

  表面生物杀灭处理的方法，通过施加含有生物杀灭剂（B）、表面活性剂（SA）（当所述生物杀灭剂是疏水性时）和至少一种水溶性或水分散性有机共聚物（C）的水性生物杀灭组合物进行。该有机共聚物（C）至少包括一种可以与所述生物杀灭剂或含有所述生物杀灭剂的表面活性剂的胶束相互作用的寡聚物或大分子单元（D）（当其为疏水性时），以及至少一种可以与待处理表面以及可选与所述生物杀灭剂相互作用的亲水性大分子单元（E）。在生物杀灭组合物中使用该共聚物（C）用作将所述生物杀灭剂传递和/或控制释放到待处理表面上的剂。
• (METH)ACRYLIC ACID ESTER, ACTIVATION ENERGY RAY CURING COMPOSITION, AND INKJET RECORDING INK
  申请人：MORITA Mitsunobu

  公开号：US20130144057A1

  公开（公告）日：2013-06-06

  (Meth)acrylic acid ester, which contains one or more partial structures each represented by the following formula 1 in a molecule thereof, wherein the partial structure is a urethane structure which does not have a hydrogen atom directly bonded to a nitrogen atom of the following formula 1: where the nitrogen atom is not bonded to a hydrogen atom.

  (Meth)acrylic acid ester，其中每个分子含有一个或多个由以下式1表示的部分结构，其中该部分结构是一种脲酯结构，不具有直接与以下式1中的氮原子结合的氢原子：其中氮原子未与氢原子结合。