3-Acetyl-bicyclo[2.2.1]hept-5-ene-2-carboxylic acid | 70013-06-8

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 酮酸及其衍生物
• 英文名称: 3-Acetyl-bicyclo[2.2.1]hept-5-ene-2-carboxylic acid
• 英文别名: 3-Acetylbicyclo[2.2.1]hept-5-ene-2-carboxylic acid
• CAS: 70013-06-8
• 化学式: C₁₀H₁₂O₃
• 分子量: 180.203
• InChiKey: JXJHQWXCLGRKTM-UHFFFAOYSA-N

物化性质

• 熔点：
  108-110 °C(Solv: benzene (71-43-2))
• 沸点：
  340.6±42.0 °C(Predicted)
• 密度：
  1.268±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.5
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.6
• 拓扑面积：
  54.4
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  R(+)-alpha-甲基苄胺 、 3-Acetyl-bicyclo[2.2.1]hept-5-ene-2-carboxylic acid 在 4-二甲氨基吡啶 、 N,N'-二环己基碳二亚胺 作用下， 以 二氯甲烷 为溶剂， 反应 24.0h， 以29%的产率得到(1S,2R,3R,4R,1'R)-3-acetyl-N-(1'-phenylethyl)bicyclo[2.2.1]hept-5-ene-2-carboxamide
  参考文献：
  名称：

  恶唑硼烷酮催化环状酸酐与甲基烯丙基锡烷的烷基化开环反应

  摘要：

  在 oxazaborolidinones (0.3 equiv) 存在下，环状酸酐与三丁基甲基烯丙基锡烷发生开环反应，生成 3-甲基丁-3-烯酰基-羧酸，经碱水溶液处理后转化为相应的乙酰基-羧酸。

  DOI：

  10.1055/s-2006-942473
• 作为产物：
  描述：

  5-甲基呋喃醛 在 双氧水 作用下， 生成 3-Acetyl-bicyclo[2.2.1]hept-5-ene-2-carboxylic acid
  参考文献：
  名称：

  Badovskaya,L.A. et al., Journal of Organic Chemistry USSR (English Translation), 1979, vol. 15, p. 43 - 47

  摘要：

  DOI：

文献信息

• BIS(AMINOPHENOL) DERIVATIVE, PROCESS FOR PRODUCING SAME, POLYAMIDE RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, INTERLAYER DIELECTRIC FILM, SEMICONDUCTOR DEVICE, AND DISPLAY ELEMENT
  申请人：Terakawa Koji

  公开号：US20100044888A1

  公开（公告）日：2010-02-25

  A bis(aminophenol) derivative having substituents at positions adjacent to two amino groups is provided. The bis(aminophenol) derivative is used as a raw material of a polyamide resin for a positive-tone photosensitive resin composition. A polyamide resin comprising bis(aminophenol) and a structure derived from a carboxylic acid is also provided, the bis(aminophenol) having substituents at positions adjacent to the two amino groups. A positive-tone photosensitive resin composition comprising a polybenzooxazole precursor resin, exhibiting high sensitivity and a high cyclization rate even when cured at a low temperature is provided. Also provided is a positive-tone photosensitive resin composition comprising a polyamide resin having an imide structure, an imide precursor structure, or an amide acid ester structure. The composition exhibits high sensitivity and produces a cured product having low water absorption even when cured at a low temperature.

  本发明提供了一种在两个氨基团相邻位置上具有取代基的双(氨基酚)衍生物。该双(氨基酚)衍生物用作聚酰胺树脂的原材料，用于制备正向感光树脂组合物。还提供了一种聚酰胺树脂，包括双(氨基酚)和由羧酸衍生的结构，其中双(氨基酚)在两个氨基团相邻位置上具有取代基。提供了一种正向感光树脂组合物，包括聚苯并噁唑前体树脂，即使在低温下固化，也表现出高灵敏度和高环化速率。还提供了一种正向感光树脂组合物，包括具有酰亚胺结构、酰亚胺前体结构或酰胺酸酯结构的聚酰胺树脂。该组合物表现出高灵敏度，即使在低温下固化，也能产生低吸水性的固化产物。
• SITE-SPECIFIC CHEMOENZYMATIC PROTEIN MODIFICATIONS
  申请人：NOVARTIS AG

  公开号：US20160237116A1

  公开（公告）日：2016-08-18

  The present invention relates to methods and reagents for use in site-selective modification of proteins having lysine residues with functionalized peptides using a chemoenzymatic microbial transglutaminase-mediated reaction. The functionalized proteins may be used for study or therapeutic uses.

  本发明涉及使用化学酶微生物转麦芽氨酰转移酶介导的反应，以功能化肽修饰具有赖氨酸残基的蛋白质的方法和试剂，用于位点选择性修饰。这些功能化蛋白质可用于研究或治疗用途。
• BIS(AMINOPHENOL) DERIVATIVE, PROCESS FOR PRODUCING THE SAME, POLYAMIDE RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITIONS, PROTECTIVE FILM, INTERLAYER DIELECTRIC, SEMICONDUCTOR DEVICE, AND DISPLAY ELEMENT
  申请人：Sumitomo Bakelite Company, Ltd.

  公开号：EP2077291A1

  公开（公告）日：2009-07-08

  A bis(aminophenol) derivative having substituents at positions adjacent to two amino groups is provided. The bis(aminophenol) derivative is used as a raw material of a polyamide resin for a positive-tone photosensitive resin composition. A polyamide resin comprising bis(aminophenol) and a structure derived from a carboxylic acid is also provided, the bis(aminophenol) having substituents at positions adjacent to the two amino groups. A positive-tone photosensitive resin composition comprising a polybenzooxazole precursor resin, exhibiting high sensitivity and a high cyclization rate even when cured at a low temperature is provided. Also provided is a positive-tone photosensitive resin composition comprising a polyamide resin having an imide structure, an imide precursor structure, or an amide acid ester structure. The composition exhibits high sensitivity and produces a cured product having low water absorption even when cured at a low temperature:

  本发明提供了一种双（氨基苯酚）衍生物，其取代基位于两个氨基的相邻位置。双（氨基苯酚）衍生物可用作正色调感光树脂组合物聚酰胺树脂的原料。还提供了一种由双（氨基苯酚）和衍生自羧酸的结构组成的聚酰胺树脂，双（氨基苯酚）在邻近两个氨基的位置上具有取代基。本发明提供了一种包含聚苯并恶唑前体树脂的正色调光敏树脂组合物，即使在低温固化时也能表现出高灵敏度和高环化率。还提供了一种正色调感光树脂组合物，该组合物由具有亚胺结构、亚胺前体结构或酰胺酸酯结构的聚酰胺树脂组成。该组合物具有高灵敏度，即使在低温下固化，也能产生低吸水性的固化产品：
• Positive type photosensitive composition
  申请人：Korea Kumho Petrochemical Co. Ltd.

  公开号：EP2292695A1

  公开（公告）日：2011-03-09

  Disclosed is a positive type photosensitive composition including a polyamide derivative being represented by where R1 and R2 independently represent a bivalent to hexavalent aryl group, R3 represents either a hydrogen atom or an alkyl group with 1 to 20 carbon atoms, R4 represents either an alkyl group having a linear structure or an aryl group having a linear structure, R5 represents any one of a bivalent to hexavalent aryl group, an alkyl group having a linear structure, and an aryl group having a linear structure, k and I independently represent an integer of 10 to 1000, n and m independently represent an integer of 0 to 2 (n+m>0), and X represents either a hydrogen atom or an aryl group with 2 to 30 carbon atoms.

  本发明公开了一种阳离子型感光组合物，其中包括一种聚酰胺衍生物，其形式为 其中 R1 和 R2 独立地代表二价至六价芳基，R3 代表氢原子或具有 1 至 20 个碳原子的烷基，R4 代表具有线性结构的烷基或具有线性结构的芳基，R5 代表二价至六价芳基中的任一个、k 和 I 独立地代表 10 至 1000 的整数，n 和 m 独立地代表 0 至 2 的整数（n+m>0），X 代表氢原子或具有 2 至 30 个碳原子的芳基。
• POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE AND DISPLAY DEVICE EACH COMPRISING THE CURED FILM
  申请人：Sumitomo Bakelite Co., Ltd.

  公开号：EP2280309A1

  公开（公告）日：2011-02-02

  A positive-type photosensitive resin composition includes (A) an alkali-soluble resin, (B) a photosensitizer, and (C) a silicon compound shown by the following general formula (1). wherein R1 represents an alkylene group having 5 to 30 carbon atoms or an organic group that includes at least one aromatic ring, and R2 represents an alkyl group having 1 to 10 carbon atoms. The positive-type photosensitive resin composition exhibits excellent storage stability, produces a film that exhibits excellent adhesion to a substrate during development, and produces a cured film that exhibits excellent adhesion to a substrate after humidification.

  一种正型光敏树脂组合物包括（A）碱溶性树脂、（B）光敏剂和（C）如下通式（1）所示的硅化合物。 其中 R1 代表具有 5 至 30 个碳原子的亚烷基或至少包括一个芳香环的有机基团，R2 代表具有 1 至 10 个碳原子的烷基。正型感光树脂组合物具有极佳的储存稳定性，在显影过程中生成的薄膜与基底具有极佳的附着力，在加湿后生成的固化薄膜与基底具有极佳的附着力。