COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME
申请人:Masuyama Tatsuro
公开号:US20110039209A1
公开(公告)日:2011-02-17
The present invention provides a compound represented by the formula (C1):
wherein R
c2
represents a C6-C10 aromatic hydrocarbon group having at least one nitro group and R
c1
represents a group represented by the formula (1):
wherein R
c4
represents a hydrogen atom etc., R
c5
represents a C1-C30 divalent hydrocarbon group, and R
c3
represents a group represented by the formula (3-1), (3-2) or (3-3):
wherein R
c6
, R
c7
, R
c8
, R
c9
, R
c10
, R
c11
, R
c12
, R
c13
and R
c14
each independently represent a C1-C30 hydrocarbon group, and a photoresist composition comprising a resin, an acid generator and the compound represented by the formula (C1).
PHOTORESIST COMPOSITION
申请人:MASUYAMA Tatsuro
公开号:US20110065040A1
公开(公告)日:2011-03-17
The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I):
wherein R
1
represents a C2-C12 alkyl group which can have one or more hydroxyl groups, etc.,
R
2
and R
3
each independently represent a hydrogen atom, etc.,
R
4
, R
5
and R
6
each independently represent a hydrogen atom, etc.,
A
1
represents a single bond or a C1-C2 alkylene group in which one or more —CH
2
— can be replaced by —O—.