β-Carboxymethyladipinsaeure | 90200-37-6

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: β-Carboxymethyladipinsaeure
• 英文别名: 3-carboxymethyl-adipic acid；3-Carboxymethyl-adipinsaeure；3-(Carboxymethyl)hexanedioic acid
• CAS: 90200-37-6
• 化学式: C₈H₁₂O₆
• 分子量: 204.18
• InChiKey: GFQYAPVDTMBMOR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.7
• 重原子数：
  14
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  112
• 氢给体数：
  3
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  β-Carboxymethyladipinsaeure 、 乙酰氯 生成 alkaline earth salt of/the/ methylsulfuric acid
  参考文献：
  名称：

  Farmer, Journal of the Chemical Society, 1923, vol. 123, p. 3330

  摘要：

  DOI：
• 作为产物：
  描述：

  alkaline earth salt of/the/ methylsulfuric acid 在 硫酸 作用下， 生成 β-Carboxymethyladipinsaeure
  参考文献：
  名称：

  Farmer, Journal of the Chemical Society, 1923, vol. 123, p. 3330

  摘要：

  DOI：

文献信息

• CONTRAST AGENTS
  申请人：Wynn Duncan

  公开号：US20090053142A1

  公开（公告）日：2009-02-26

  The present invention relates to a class of compounds and to diagnostic compositions containing such compounds where the compounds are iodine containing compounds. More specifically the iodine containing compounds are chemical compounds containing an aliphatic central moiety containing amide functions allowing for the arrangement of three iodinated phenyl groups bound thereto. The invention also relates to the use of such diagnostic compositions as contrast agents in diagnostic imaging and in particular in X-ray imaging and to contrast media containing such compounds.

  本发明涉及一类化合物和含有这种化合物的诊断组合物，其中这些化合物是含碘的化合物。更具体地，这些含碘化合物是化学化合物，其中包含具有酰胺功能的脂肪族中心基团，允许将三个碘化苯基团连接到其中。本发明还涉及将这种诊断组合物用作对比剂进行诊断成像，特别是在X射线成像中，并涉及含有这种化合物的对比介质。
• Treatment liquid for manufacturing semiconductor and pattern forming method
  申请人：FUJIFILM Corporation

  公开号：US11256173B2

  公开（公告）日：2022-02-22

  An object of the present invention is to provide a treatment liquid for manufacturing a semiconductor and a pattern forming method, in which the formation of particles including metal atoms can be reduced and an excellent pattern can be formed. A treatment liquid for manufacturing a semiconductor according to an embodiment of the present invention includes: a quaternary ammonium compound represented by Formula (N); at least one additive selected from the group consisting of an anionic surfactant, a nonionic surfactant, a cationic surfactant, and a chelating agent; and water. The treatment liquid for manufacturing a semiconductor includes one kind or two or more kinds of metal atoms selected from the group consisting of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni, and Zn, and a total mass of the metal atoms is 1 mass ppt to 1 mass ppm with respect to the sum of a total mass of the additive and the total mass of the metal atoms.

  本发明的目的是提供一种用于制造半导体的处理液和一种图案形成方法，在这种处理液和方法中，可以减少包括金属原子在内的颗粒的形成，并且可以形成极好的图案。 根据本发明的一个实施方案，用于制造半导体的处理液包括：由式（N）表示的季铵盐化合物；至少一种添加剂，该添加剂选自由阴离子表面活性剂、非离子表面活性剂、阳离子表面活性剂和螯合剂组成的组；以及水。用于制造半导体的处理液包括一种或两种以上选自 Na、K、Ca、Fe、Cu、Mg、Mn、Li、Al、Cr、Ni 和 Zn 组的金属原子，且金属原子的总质量相对于添加剂总质量和金属原子总质量之和为 1 质量 ppt 至 1 质量 ppm。
• Carriere, Annales de Chimie (Cachan, France), 1922, vol. <9> 17, p. 122
  作者：Carriere

  DOI：——

  日期：——
• CONTAINER, METHOD FOR MANUFACTURING CONTAINER, AND CHEMICAL LIQUID STORAGE BODY
  申请人：FUJIFILM Corporation

  公开号：US20200115105A1

  公开（公告）日：2020-04-16

  A container has a base material and a coating layer which is disposed on at least a portion of the base material, contains a composition containing at least one kind of metal component selected from the group consisting of Ti, Al, Mg, Zr, Hf, Fe, Ni, Sn, Zn, Cr, and Mo, and has a thickness equal to or greater than 50 μm. In a case where the composition contains one kind of metal component, a ratio RCAs calculated by CA1s/CA2s is less than 1.0. Alternatively, in a case where the composition contains two or more kinds of metal components, in at least a portion of the coating layer, an average of RCAs determined for each of two or more kinds of the metal components is less than 1.0.
• METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20220121123A1

  公开（公告）日：2022-04-21

  A method for manufacturing an electronic device, the method including performing a treatment using a treatment liquid for manufacturing a semiconductor, the treatment liquid for manufacturing a semiconductor includes: a quaternary ammonium compound represented by the following Formula (N); at least one additive selected from the group consisting of an anionic surfactant, a nonionic surfactant, a cationic surfactant, and a chelating agent; water; and one kind or two or more kinds of metal atoms selected from the group consisting of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni, and Zn. A ratio T 1 of a total mass of the metal atoms to the sum of a total mass of the additive and the total mass of the metal atoms is in a range from 1 ppt to 1 ppm.