The present invention relates to a tectosilicate having an X-ray diffraction pattern in which at least the following reflections occur:
Intensity (%)
Diffraction angle 2θ/° [Cu K(alpha 1)]
100
9.8-10.2
24-34
11.0-11.4
9-19
15.5-15.9
12-22
19.4-19.6
19-29
19.6-19.8
100% relating to the intensity of the maximum peak in the X-ray diffraction pattern.
本发明涉及一种具有X射线衍射图谱的
硅酸盐,其中至少出现以下反射:强度(%)衍射角2θ/° [Cu K(alpha 1)]100 9.8-10.224-3411.0-11.4 9-1915.5-15.912-2219.4-19.619-2919.6-19.8100%与X射线衍射图谱中最大峰的强度相关。