CLEANING COMPOSITION AND METHOD OF MANUFACTURING METAL WIRING USING THE SAME
申请人:Samsung Display Co., Ltd.
公开号:US20150136728A1
公开(公告)日:2015-05-21
A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.
US5026856A
申请人:——
公开号:US5026856A
公开(公告)日:1991-06-25
US9340759B2
申请人:——
公开号:US9340759B2
公开(公告)日:2016-05-17
US9869027B2
申请人:——
公开号:US9869027B2
公开(公告)日:2018-01-16
Isoindoline derivative
申请人:Wakunaga Seiyaku Kabushiki Kaisha
公开号:US05026856A1
公开(公告)日:1991-06-25
Isoindoline derivatives represented by the formula (I) and their salts are disclosed. ##STR1## There are many varieties for the compound depending on the types of residues R.sup.1 -R.sup.9 and X. The compounds can be prepared from quinoline derivatives of the formula (II) and an isoindoline derivatives of the formula (III). The compounds of formula (I) and their salts have excellent antibacterial activities against both gram positive and gram negative microorganisms. They can be used as a medicine, an agrichemical, and a food preservative.