New synthesis and properties of 11,11,12,12-tetracyano-9,10-anthraquinodimethane: an electron acceptor displaying a single-wave, two-electron reduction and a coproportionation pathway to the radical anion
PROCESS FOR PRODUCTION OF DESUBSTITUTED COMPOUNDS, ORGANIC SEMICONDUCTOR FILM AND PROCESS FOR PRODUCTION OF THE FILM
申请人:Fujifilm Corporation
公开号:EP2192631A1
公开(公告)日:2010-06-02
A method of producing a desubstituted compound, including: applying an external stimulation to a compound A-(B)m having a solvent-soluble group B (wherein A represents a residue of a solvent-insoluble compound, B represents a specific solvent-soluble group, and m represents a natural number, and the solvent-soluble group B bonds to a carbon atom of the residue A of a solvent-insoluble compound), to cause desubstitution of the solvent-soluble group B, and converting the compound to a solvent-insoluble compound to which a hydrogen atom bonds in place of the solvent-soluble group B; a method of producing an organic semiconductor film, including: forming a film of a π-conjugated compound having a substituent represented by formula (2-1), on a substrate; and causing desubstitution of the substituent from the compound; and an organic semiconductor film and an organic electronic device each obtained by these methods:
wherein R11 represents a substituent other than a hydrogen atom.
一种生产去取代基化合物的方法,包括对具有溶剂可溶性基团 B 的化合物 A-(B)m(其中 A 代表溶剂不溶性化合物的残余物,B 代表特定的溶剂可溶性基团,m 代表自然数)施加外部刺激,使溶剂可溶性基团 B 与溶剂不溶性化合物的残余物 A 的碳原子发生脱取代反应、且溶剂可溶性基团 B 与溶剂不溶性化合物残余物 A 的碳原子键合),使溶剂可溶性基团 B 脱取代,并将该化合物转化为以氢原子代替溶剂可溶性基团 B 键合的溶剂不溶性化合物;一种生产有机半导体薄膜的方法,包括在基底上形成具有由式(2-1)表示的取代基的π-共轭化合物的薄膜;并使取代基从化合物中脱取代;以及通过这些方法分别获得的有机半导体薄膜和有机电子器件:
其中 R11 代表氢原子以外的取代基。
Kini, Aravinda M.; Cowan, Dwaine O.; Gerson, Fabian, Molecular Crystals and Liquid Crystals (1969-1991), 1985, vol. 120, p. 299 - 304
New synthesis and properties of 11,11,12,12-tetracyano-9,10-anthraquinodimethane: an electron acceptor displaying a single-wave, two-electron reduction and a coproportionation pathway to the radical anion
作者:Aravinda M. Kini、Dwaine O. Cowan、Fabian Gerson、Reinhart Moeckel