POLYMERIC PRECURSORS FOR PRODUCING GRAPHENE NANORIBBONS AND SUITABLE OLIGOPHENYLENE MONOMERS FOR PREPARING THEM
申请人:BASF SE
公开号:US20150299381A1
公开(公告)日:2015-10-22
The invention relates to oligophenylene monomers of general formula I, wherein R
1
is H, halogene, —OH, —NH
2
, —CN, —NO
2
, or a linear or branched, saturated or un-saturated C
1
-C
40
hydrocarbon residue, which can be substituted
1
- to
5
-fold with halogene (F, Cl, Br, I), —OH, —NH
2
, —CN and/or —NO
2
, and wherein one or more CH
2
-groups can be replaced by —O—, —S—, —C(O)O—, —O—C(O)—, —C(O)—, —NH— or —NR
3
—, wherein R
3
is an optionally substituted C
1
-C
40
hydrocarbon residue, or an optionally substituted aryl, al-kylaryl, alkoxyaryl, alkanoyl or aroyl residue; R
2a
and R
2b
are H, or optionally one or more of the pairs of adjacent R
2a
/R
2b
is joined to form a single bond in a six-membered carbocycle; m is an integer of from
0
to
3
; n is
0
or
1
; and X is halogene or trifluoromethylsulfonate, and Y is II; or X is II, and Y is halogene or trifluoromethylsulfonate. The invention further relates to polymeric precursors as well as methods for preparing graphene nanoribbons from the oligophenylene monomers and the polymeric precursors.
本发明涉及一般式I的寡苯乙烯单体,其中R1为H,卤素,-OH,-NH2,-CN,-NO2或线性或支链的饱和或不饱和的C1-C40碳氢基团,可以用卤素(F、Cl、Br、I)、-OH、-NH2、-CN和/或-NO2替代1-5次,其中一个或多个CH2基团可以被-O-、-S-、-C(O)O-、-O-C(O)-、-C(O)-、-NH-或-NR3-替换,其中R3是可选择的取代的C1-C40碳氢基团或可选择的取代的芳基、烷基芳基、烷氧基芳基、烷酰基或芳酰基基团;R2a和R2b为H,或者相邻的一个或多个R2a/R2b对连接成一个六元碳环的单键;m为0到3的整数;n为0或1;X为卤素或三氟甲烷磺酸盐,Y为II;或者X为II,Y为卤素或三氟甲烷磺酸盐。本发明还涉及聚合物前体以及从寡苯乙烯单体和聚合物前体制备石墨烯纳米带的方法。