PHOTOSENSITIVE COPOLYMER, PHOTORESIST COMPRISING THE COPOLYMER, AND METHOD OF FORMING AN ELECTRONIC DEVICE
申请人:ROHM AND HAAS ELECTRONIC MATERIALS LLC
公开号:US20140242521A1
公开(公告)日:2014-08-28
A copolymer includes the polymerized product of a comonomer and a monomer having the formula (I):
wherein c is 0, 1, 2, 3, 4, or 5; R
a
is H, F, —CN, C
1-10
alkyl, or C
1-10
fluoroalkyl; R
x
and R
y
are each independently an unsubstituted or substituted C
1-10
linear or branched alkyl group, an unsubstituted or substituted C
3-10
cycloalkyl group, an unsubstituted or substituted C
3-10
alkenylalkyl group, or an unsubstituted or substituted C
3-10
alkynylalkyl group; wherein R
x
and R
y
together optionally form a ring; and R
z
is a C
6-20
aryl group substituted with an acetal-containing group or a ketal-containing group, or a C
3
-C
20
heteroaryl group substituted with an acetal-containing group or a ketal-containing group, wherein the C
6-20
aryl group or the C
3
-C
20
heteroaryl group can, optionally, be further substituted. Also described are a photoresist including the copolymer, a coated substrate having a layer of the photoresist, and a method of forming an electronic device utilizing the photoresist.
一种共聚物包括共聚物化的共聚单体和单体,其具有以下公式(I):
其中c为0、1、2、3、4或5;R为H、F、—CN、C1-10烷基或C1-10氟烷基;Rx和Ry分别独立地为未取代或取代的C1-10线性或支链烷基、未取代或取代的C3-10环烷基、未取代或取代的C3-10烯基烷基或未取代或取代的C3-10炔基烷基;其中Rx和Ry可以一起选择形成一个环;而Rz为一个C6-20芳基基团,其被含有缩醛基团或缩酮基团的基团取代,或者是一个C3-C20杂环芳基基团,其被含有缩醛基团或缩酮基团的基团取代,其中C6-20芳基基团或C3-C20杂环芳基基团可以选择进一步取代。还描述了一种包括该共聚物的光阻、具有光阻层的涂层基板以及利用光阻形成电子器件的方法。