Production Processes and Systems, Compositions, Surfactants, Monomer Units, Metal Complexes, Phosphate Esters, Glycols, Aqueous Film Forming Foams, and Foam Stabilizers
申请人:Boggs Janet
公开号:US20080009655A1
公开(公告)日:2008-01-10
Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF
3
groups with reactants having cyclic groups. R
F
-compositions such as R
F
-intermediates, R
F
-surfactants, R
F
-monomers, R
F
-monomer units, R
F
-metal complexes, R
F
-phosphate esters, R
F
-glycols, R
F
-urethanes, and/or R
F
-foam stabilizers. The R
F
portion can include at least two —CF
3
groups, at least three —CF
3
groups, and/or at least two —CF
3
groups and at least two —CH
2
— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the R
F
-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a R
F
-monomer unit. Compositions are provided that include a substrate having a R
F
-composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include R
F
-surfactants and/or R
F
-foam stabilizers are provided.
提供了生产过程和系统,其中包括反应卤代化合物,去卤化化合物,反应醇,反应烯烃和饱和化合物,反应至少具有两个-CF3基团的反应物与具有环状基团的反应物。提供了RF组分,例如RF中间体,RF表面活性剂,RF单体,RF单体单元,RF金属配合物,RF磷酸酯,RF乙二醇,RF聚氨酯和/或RF泡沫稳定剂。RF部分可以包括至少两个-CF3基团,至少三个-CF3基团,以及至少两个-CF3基团和至少两个-CH2-基团。提供了包括RF表面活性剂组分的洗涤剂,乳化剂,油漆,粘合剂,油墨,润湿剂,泡沫剂和消泡剂。提供了包括RF单体单元的丙烯酸,树脂和聚合物。提供了包括具有RF组分的基板的组合物。提供了含有RF表面活性剂和/或RF泡沫稳定剂的水性成膜泡沫(“AFFF”)配方。