The gas-phase Smiles rearrangement the effect of ring substitution. An18O labelling study
作者:Peter C. H. Eichinger、John H. Bowie
DOI:10.1002/oms.1210271007
日期:1992.10
AbstractThe gas‐phase Smiles reaction of RC6H4O(CH2)nO−(n = 2 or 3) is an ipso rearrangement which is strongly influenced by the nature of the substituent R. Electron‐withdrawing groups enhance the rearrangement. When the substituent R is halogen or MeO, and occupies the ortho position, ortho cyclization competes with the Smiles rearrangement.