N-ethyl-N-methyl-3-buten-1-amine | 61308-10-9

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: N-ethyl-N-methyl-3-buten-1-amine
• 英文别名: 3-Buten-1-amine, N-ethyl-N-methyl-；N-ethyl-N-methylbut-3-en-1-amine
• CAS: 61308-10-9
• 化学式: C₇H₁₅N
• 分子量: 113.203
• InChiKey: JSZYJLWPFIRXNJ-UHFFFAOYSA-N

物化性质

• 沸点：
  115.2±19.0 °C(Predicted)
• 密度：
  0.773±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  8
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.71
• 拓扑面积：
  3.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  N-ethyl-N-methyl-3-buten-1-amine 在 magnesium hydride 、 氯化锆(IV) 作用下， 以 四氢呋喃 为溶剂， 以39.5%的产率得到
  参考文献：
  名称：

  Angermund, Klaus; Bogdanovic, Borislav; Koppetsch, Gudrun, Zeitschrift fur Naturforschung, Teil B: Anorganische Chemie, Organische Chemie, 1986, vol. 41, # 4, p. 455 - 466

  摘要：

  DOI：
• 作为产物：
  描述：

  N-乙基甲基胺 、 4-溴-1-丁烯 以67%的产率得到N-ethyl-N-methyl-3-buten-1-amine
  参考文献：
  名称：

  Angermund, Klaus; Bogdanovic, Borislav; Koppetsch, Gudrun, Zeitschrift fur Naturforschung, Teil B: Anorganische Chemie, Organische Chemie, 1986, vol. 41, # 4, p. 455 - 466

  摘要：

  DOI：

文献信息

• Triazole compounds and methods of making and using the same
  申请人：Bhattacharjee Ashoke

  公开号：US20100016956A1

  公开（公告）日：2010-01-21

  The present invention provides triazole macrocyclic compounds useful as therapeutic agents. More particularly, these compounds are useful as anti-infective, anti-proliferative, anti-inflammatory, and prokinetic agents. The compounds have the following structure: wherein T is the macrocyclic part.

  本发明提供了三唑大环化合物，作为治疗剂非常有用。更具体地说，这些化合物可用作抗感染、抗增殖、抗炎和促动力剂。化合物具有以下结构：其中T是大环部分。
• Triazole Compounds and Methods of Making and Using the Same
  申请人：Bhattacharjee Ashoke

  公开号：US20130065845A1

  公开（公告）日：2013-03-14

  The present invention provides triazole macrocyclic compounds useful as therapeutic agents. More particularly, these compounds are useful as anti-infective, anti-proliferative, anti-inflammatory, and prokinetic agents.

  本发明提供了三唑大环化合物，其作为治疗剂具有用途。更具体地说，这些化合物可作为抗感染、抗增殖、抗炎和促动力剂使用。
• CARBOSTYRIL DERIVATIVES
  申请人：OTSUKA PHARMACEUTICAL CO., LTD.

  公开号：EP0450066A1

  公开（公告）日：1991-10-09

  This invention relates to carbostyril derivatives represented by general formula (1), a process for their preparation, and an agent for inhibiting agglutination of platelets containing them as an active ingredient, wherein A represents a lower alkylene group, R1 represents a substituted or unsubstituted cycloalkyl-lower alkyl group, a cycloalkyl group, a tetrahydropyranyl* lower alkyl group, a lower alkylenedioxy-substituted lower alkyl group, a substituted phenyl-lower alkyl group or a lower alkyl-substituted piperidinyl-lower alkyl group, R2 represents a substituted or unsubstituted 5- or 6-membered, saturated or unsaturated heterocyclic-lower alkyl group, a tetrahydropyranylthio-lower alkyl group, a pyridylthio-lower alkyl group, a lower alkylene-dioxy-substituted lower alkyl group or a substituted or unsubstituted lower alkyl group, and the carbon-to-carbon bond between the 3- position and the 4-position of the carbostyril skeleton represents either a single or a double bond.

  本发明涉及通式(1)代表的碳化二氢吡啶衍生物、其制备工艺以及含有其作为活性成分的抑制血小板凝集的制剂，其中A代表低级亚烷基，R1代表取代或未取代的环烷基-低级烷基、环烷基、四氢吡喃基*低级烷基、低级亚烷基-二氧基取代的低级烷基、取代的苯基-低级烷基或低级烷基-取代的哌啶基-低级烷基、R2 代表取代或未取代的 5 或 6 元、饱和或不饱和杂环低级烷基、四氢吡喃硫基低级烷基、吡啶硫基低级烷基、亚烷基二氧基取代的低级烷基或取代或未取代的低级烷基，碳四吡啶骨架的 3 位和 4 位之间的碳-碳键代表单键或双键。
• CHEMICAL VAPOR DEPOSITION STARTING MATERIAL COMPRISING ORGANIC PLATINUM COMPOUND, AND CHEMICAL VAPOR DEPOSITION METHOD USING SAID CHEMICAL VAPOR DEPOSITION STARTING MATERIAL
  申请人：Tanaka Kikinzoku Kogyo K.K.

  公开号：EP3296425A1

  公开（公告）日：2018-03-21

  The present invention relates to a raw material for chemical deposition in a formula shown below and including an organoplatinum compound in which an alkenyl amine and an alkyl anion are coordinated to divalent platinum. In the formula, n is 1 or more and 5 or less. Each of substituents R1 to R5 on the alkenyl amine is a hydrogen atom, an alkyl group or the like and has a carbon number of 4 or less. Each of alkyl anions R6 and R7 is an alkyl group having a carbon number of 1 or more and 3 or less. The raw material has high vapor pressure enough to make possible the manufacturing of a platinum thin film at low temperature and also has moderate thermal stability.

  本发明涉及一种化学沉积原料，其化学式如下所示，包括一种有机铂化合物，其中烯基胺和烷基阴离子与二价铂配位。式中，n 为 1 或 1 以上，5 或 5 以下。烯基胺上的每个取代基 R1 至 R5 是氢原子、烷基或类似基团，碳数为 4 或更少。烷基阴离子 R6 和 R7 中的每一个都是烷基，其碳原子数为 1 或 1 以上、3 或 3 以下。这种原料具有较高的蒸气压，足以在低温下制造铂薄膜，并具有适度的热稳定性。
• Organoplatinum compound for use in the chemical deposition of platinum compound thin films
  申请人：TANAKA KIKINZOKU KOGYO K.K.

  公开号：US10465283B2

  公开（公告）日：2019-11-05

  An organoplatinum compound with the following formula for use as a raw material in the chemical deposition of platinum compound thin films. In the formula, n is 1 or more and 5 or less. Each of substituents R1 to R5 on the alkenyl amine is a hydrogen atom, an alkyl group or the like and has a carbon number of 4 or less. Each of alkyl anions R6 and R7 is an alkyl group having a carbon number of 1 or more and 3 or less. The vapor pressure of the organoplatinum compound is high enough to allow for the manufacturing of a platinum thin film at low temperature. It also has moderate thermal stability.

  一种具有下式的有机铂化合物，可用作铂化合物薄膜化学沉积的原料。式中，n 为 1 或 1 以上，5 或 5 以下。烯胺上的每个取代基 R1 至 R5 是氢原子、烷基或类似基团，碳数为 4 或更少。烷基阴离子 R6 和 R7 中的每一个都是烷基，其碳原子数为 1 或 1 以上 3 或 3 以下。有机铂化合物的蒸汽压足够高，可以在低温下制造铂薄膜。它还具有适度的热稳定性。