Diaryltetraoxypersulfuranes: preparation, characterization, and reactions
作者:William Y. Lam、J. C. Martin
DOI:10.1021/ja00391a023
日期:1981.1
LAM, W. Y.;MARTIN, J. C., J. ORG. CHEM., 1981, 46, N 22, 4468-4473
作者:LAM, W. Y.、MARTIN, J. C.
DOI:——
日期:——
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND MASK BLANK
申请人:FUJIFILM Corporation
公开号:US20170121437A1
公开(公告)日:2017-05-04
A pattern forming method includes forming a film using an actinic ray-sensitive or radiation-sensitive resin composition, exposing the film with active light or radiation, and developing the exposed film using a developer including an organic solvent, in which the actinic ray-sensitive or radiation-sensitive resin composition contains a compound having a partial structure represented by General Formula (I).
LAM W. Y.; MARTIN J. C., J. AMER. CHEM. SOC., 1981, 103, NO 1, 120-127
作者:LAM W. Y.、 MARTIN J. C.
DOI:——
日期:——
ZAU P. H. W.; MARTIN J. C., J. AMER. CHEM. SOC. <JACS-AT>, 1977, 99, NO 16, 5490-5491