Bis-o-aminophenols and o-aminophenolcarboxylic acids and process for preparing the same
申请人:——
公开号:US20020010370A1
公开(公告)日:2002-01-24
Bis-o-aminophenols and o-aminophenolcarboxylic acids have the following structures:
1
A
1
to A
7
are, independently of each other, H, F, CH
3
, CF
3
, OCH
3
or OCF
3
. T is an aromatic or heterocyclic residue. A method for preparing bis-o-aminophenols and o-aminophenolcarboxylic acids is also provided.
Die Erfindung betrifft neue Bis-o-aminophenole und o-Aminophenolcarbonsäuren folgender Struktur:
dabei gilt Folgendes:
A1 bis A7 sind - unabhängig voneinander - H, F, CH3, CF3, OCH3 oder OCF3;
T ist ein aromatischer oder heterocyclischer Rest.
Polybenzoxazole precursors, photoresist solution, polybenzoxazole, and process for preparing a polybenzoxazole precursor
申请人:——
公开号:US20020086968A1
公开(公告)日:2002-07-04
There are disclosed polybenzoxazole precursors which can be processed by centrifugal techniques, which can be cyclized to polybenzoxazoles on substrates without difficulty, and which after cyclization to polybenzoxazoles exhibit a high temperature stability. In particular, these precursors and the polybenzoxazoles prepared from them possess high resistance against the diffusion of metals.