NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
申请人:International Business Machines Corporation
公开号:US20210317270A1
公开(公告)日:2021-10-14
Provided is a compound that can be used as a base resin for a photosensitive resin composition. The photosensitive resin can form a fine pattern and can achieve high resolution without impairing mechanical strength and solubility. The compound is represented by the general formula (1):
wherein Z represents a linear, branched or cyclic divalent hydrocarbon group having 2 to 30 carbon atoms; X
1
to X
3
represent any of —CO
2
—, —CONR
X1
—, —O—, —NR
X1
—, —S—, —SO
2
—, —SO
3
— and —SO
2
NR
X1
— and may be the same as or different from each other, provided that R
X1
is a hydrogen atom or a monovalent hydrocarbon group having 1 to 30 carbon atoms; Ar represents a divalent aromatic group having 2 to 30 carbon atoms; L
1
and L
2
independently represent a divalent hydrocarbon group having 1 to 30 carbon atoms; and x and y are each independently 0 or 1.
提供的是一种可以用作光敏树脂组合物的基树脂的化合物。这种光敏树脂可以形成精细图案,并且可以在不影响机械强度和溶解性的情况下实现高分辨率。该化合物由通式(1)表示:其中Z代表具有2到30个碳原子的线性、支链或环状二价碳氢基团;X1到X3代表任何一种—CO2—、—CONRX1—、—O—、—NRX1—、—S—、—SO2—、—SO3—和—SO2NRX1—中的一种,并且它们可以相同也可以不同,只要RX1是氢原子或具有1到30个碳原子的一价碳氢基团;Ar代表具有2到30个碳原子的二价芳香基团;L1和L2分别代表具有1到30个碳原子的二价碳氢基团;x和y分别独立地为0或1。