Ameisensaeure-(3,4-dimethyl-phenylester) | 1864-98-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Ameisensaeure-(3,4-dimethyl-phenylester)
• 英文别名: (3,4-Dimethylphenyl) formate
• CAS: 1864-98-8
• 化学式: C₉H₁₀O₂
• 分子量: 150.177
• InChiKey: QVAOPWATSRAHNS-UHFFFAOYSA-N

物化性质

• 沸点：
  117 °C(Press: 20 Torr)
• 密度：
  1.047±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  11
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.22
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  Ameisensaeure-(3,4-dimethyl-phenylester) 在 1,1-二氯甲醚 、 mercury dichloride 作用下， 生成 Dichlormethyl-3,4-dimethylphenylaether
  参考文献：
  名称：

  Holsboer,D.H. et al., Recueil des Travaux Chimiques des Pays-Bas, 1971, vol. 90, p. 556 - 561

  摘要：

  DOI：
• 作为产物：
  描述：

  3,4-二甲基苯酚 、 甲酸 生成 Ameisensaeure-(3,4-dimethyl-phenylester)
  参考文献：
  名称：

  Stevens,W.; van Es,A., Recueil des Travaux Chimiques des Pays-Bas, 1964, vol. 83, p. 1294 - 1298

  摘要：

  DOI：

文献信息

• Palladium-Catalyzed Carbonylation of Indoles using Aryl Formates as Bifunctional Reagents: A Route to Indol-3-yl Aryl Ketones
  作者：Li-Jun Gu、Yu-Shen Wang、Hong-Tao Zhang、Huai-Jun Tang、Gan-Peng Li、Ming-Long Yuan

  DOI：10.1002/cctc.201600433

  日期：2016.7.6

  A new Pd‐catalyzed carbonylation of indoles for the synthesis of indol‐3‐yl aryl ketones under CO‐free conditions was developed. The reaction showed a broad substrate scope with moderate to excellent yields.

  开发了一种新的钯催化的吲哚羰基化反应，用于在无CO条件下合成吲哚-3-基芳基酮。反应显示出广泛的底物范围，具有中等至优异的产率。
• CHROMENE COMPOUND
  申请人：Takahashi Toshiaki

  公开号：US20120170098A1

  公开（公告）日：2012-07-05

  A photochromic chromene compound having an indeno(2,1-f)naphtho(1,2-b)pyran structure as its basic skeleton, an aryl group or a heteroaryl group at the 6-position carbon atom of the structure and an electron donor group having a Hammett constant σ p of not more than −0.1 at the 7-position carbon atom.

  一种具有吲哚并[2,1-f]萘并[1,2-b]苯并吡喃结构作为其基本骨架的光致变色的色烯化合物，其在结构的6位碳原子处具有芳基或杂环芳基，并且在7位碳原子处具有哈密特常数σp不大于-0.1的电子给体基团。
• NON-AQUEOUS ELECTROLYTIC SOLUTION, ELECTRICAL STORAGE DEVICE UTILIZING SAME, AND CYCLIC SULFONIC ACID ESTER COMPOUND
  申请人：Ube Industries, Ltd.

  公开号：EP2704246A1

  公开（公告）日：2014-03-05

  An object of the present invention is to provide a nonaqueous electrolytic solution capable of improving electrochemical characteristics in a broad temperature range, an energy storage device using it. A nonaqueous electrolytic solution of an electrolyte salt dissolved in a nonaqueous solvent, which comprises at least one cyclic sulfonic acid ester compound represented by the following general formula (I), and an energy storage device. (wherein R1 and R2 may be the same or different, each representing a hydrogen atom, an alkyl group in which at least one hydrogen atom may be substituted with a halogen atom, or a halogen atom; L represents a divalent hydrocarbon group of an alkylene group in which at least one hydrogen atom is substituted with OR3, or a divalent hydrocarbon group of an alkylene group in which at least one methylene (CH2) is substituted with C(=O); R3 represents a formyl group, an alkylcarbonyl group, an alkenylcarbonyl group, an alkenylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an alkenyloxycarbonyl group, an alkynyloxycarbonyl group, an aryloxycarbonyl group, a 2,2-dioxide-1,2-oxathiolan-4-yloxycarbonyl group, a 2,2-dioxide-1,2-oxathian-4-yloxycarbonyl group, an alkanesulfonyl group, an arylsulfonyl group, a dialkylphosphoryl group, an alkoxy(alkyl)phosphoryl group, a dialkoxyphosphoryl group, -S(O)-OR4, or -C(O)CH2P(O)(OR5)2; R4 represents an alkyl group, a 2,2-dioxide-1,2-oxathiolan-4-yl group, or a 2,2-dioxide-1,2-oxathian-4-yl group; R5 represents an alkyl group; further, in R3, at least one hydrogen atom may be substituted with a halogen atom, and L may be further substituted with any of an alkyl group, a haloalkyl group or a halogen atom).

  本发明的目的是提供一种能够在宽温度范围内改善电化学特性的非水性电解溶液，以及使用该溶液的储能装置。 一种溶解在非水溶剂中的电解质盐的非水性电解溶液，它包含至少一种由以下通式（I）表示的环磺酸酯化合物，以及一种储能装置。 (其中 R1 和 R2 可以相同或不同，各自代表氢原子、其中至少一个氢原子可被卤素原子取代的烷基或卤素原子；L 代表其中至少一个氢原子被 OR3 取代的亚烷基的二价烃基，或其中至少一个亚甲基 (CH2) 被 C(=O) 取代的亚烷基的二价烃基；R3 代表甲酰基、烷基羰基、烯基羰基、芳基羰基、烷氧基羰基、烯氧基羰基、炔氧基羰基、芳氧基羰基、2,2-二氧-1、2-氧硫杂环戊-4-基氧基羰基、2,2-二氧-1,2-氧硫杂环戊-4-基氧基羰基、烷基磺酰基、芳基磺酰基、二烷基磷酰基、烷氧基（烷基）磷酰基、二烷氧基磷酰基、-S(O)-OR4 或 -C(O)CH2P(O)(OR5)2；R4 代表烷基、2,2-二氧代-1,2-氧硫杂环戊-4-基或 2,2-二氧代-1,2-氧硫杂环戊-4-基；R5 代表烷基；此外，在 R3 中，至少一个氢原子可被卤素原子取代，L 可进一步被烷基、卤代烷基或卤素原子中的任何一个取代。）
• RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT
  申请人：Mitsui Chemicals, Inc.

  公开号：EP3693793A1

  公开（公告）日：2020-08-12

  Provided is a resin material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the resin material including a cyclic olefin polymer (I), in which a temperature at an intersection between a storage modulus (G') curve and a loss modulus (G") curve in a solid viscoelasticity of the resin material for forming an underlayer film which is as measured under conditions of a measurement temperature range of 30°C to 300°C, a heating rate of 3°C/min, and a frequency of 1 Hz in a nitrogen atmosphere in a shear mode using a rheometer is higher than or equal to 40°C and lower than or equal to 200°.

  本发明提供了一种用于形成底层膜的树脂材料，该底层膜可用于形成多层光刻胶工艺中使用的光刻胶底层膜，该树脂材料包括环烯烃聚合物 (I)、其中，用于形成底层膜的树脂材料的固体粘弹性中的存储模量（G'）曲线和损失模量（G"）曲线的交点温度高于或等于 40°C，且低于或等于 200°C；该固体粘弹性是在测量温度范围为 30°C 至 300°C、加热速率为 3°C/min 和频率为 1 Hz 的条件下，在氮气环境中使用流变仪以剪切模式测得的。
• MATERIAL FOR UNDERLAYER FILM FORMATION USE, RESIST UNDERLAYER FILM, AND LAMINATE
  申请人：Mitsui Chemicals, Inc.

  公开号：EP3922456A1

  公开（公告）日：2021-12-15

  A material for forming an underlayer film used in a multi-layer resist process satisfies: (i) an elemental composition ratio Re defined by the following mathematical formula (1) is 1.5 to 2.8; (ii) a glass transition temperature is 30°C to 250°C; and (iii) the material contains at least one (preferably two or more) resin having a specific structural unit. In the mathematical formula (1), NH is the number of hydrogen atoms in the solid content of the material for forming an underlayer film, NC is the number of carbon atoms in the solid content of the material for forming an underlayer film, and NO is the number of oxygen atoms in the solid content of the material for forming an underlayer film. Re=NH+NC+NONC−NO

  一种用于形成多层抗蚀剂工艺中使用的底层薄膜的材料符合以下条件：(i) 由以下数学公式（1）定义的元素组成比 Re 为 1.5 至 2.8；(ii) 玻璃转化温度为 30°C 至 250°C；(iii) 材料含有至少一种（最好是两种或两种以上）具有特定结构单元的树脂。在数学公式（1）中，NH 是形成底层薄膜的材料固体成分中氢原子的数目，NC 是形成底层薄膜的材料固体成分中碳原子的数目，NO 是形成底层薄膜的材料固体成分中氧原子的数目。Re=NH+NC+NONC-NO