bis(1,5-di-tert-butyl-1,2,5-triazapentadienyl)nickel(II) | 1420864-94-3

• 分子结构分类: 有机化合物 - 有机1,3-偶极化合物 - 炔丙基型1，3-偶极有机化合物
• 英文名称: bis(1,5-di-tert-butyl-1,2,5-triazapentadienyl)nickel(II)
• CAS: 1420864-94-3
• 化学式: C₂₀H₄₀N₆Ni
• 分子量: 423.268
• InChiKey: RGUOZMLSDSYKRA-SGWVQXGMSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  None
• 重原子数：
  None
• 可旋转键数：
  None
• 环数：
  None
• sp3杂化的碳原子比例：
  None
• 拓扑面积：
  None
• 氢给体数：
  None
• 氢受体数：
  None

反应信息

• 作为产物：
  描述：

  1,5-di-tert-butyl-1,2,5-triazapentadiene 在 potassium hydride 作用下， 以 四氢呋喃 为溶剂， 反应 19.0h， 生成 bis(1,5-di-tert-butyl-1,2,5-triazapentadienyl)nickel(II)
  参考文献：
  名称：

  Volatility and High Thermal Stability in Mid-to-Late First-Row Transition-Metal Complexes Containing 1,2,5-Triazapentadienyl Ligands

  摘要：

  Treatment of first-row transition-metal MCl2 (M = Ni, Co, Fe, Mn, Cr) with 2 equiv of the potassium 1,2,5-triazapentadienyl salts K(tBuNNCHCHNR) (R = tBu, NMe2) afforded M(tBuNNCHCHNR)(2) in 18-73% isolated yields after sublimation. The X-ray crystal structures of these compounds show monomeric, tetrahedral molecular geometries, and magnetic moment measurements are consistent with high-spin electronic configurations. Complexes with R = tBu sublime between 155 and 175 degrees C at 0.05 Torr and have decomposition temperatures that range from 280 to 310 degrees C, whereas complexes with R = NMe2 sublime at 105 degrees C at 0.05 Torr but decompose between 181 and 225 degrees C. This work offers new nitrogen-rich ligands that are related to widely used beta-diketiminate and 1,3,5-triazapentadienyl ligands and demonstrates new complexes with properties suitable for use in atomic-layer deposition.

  DOI：

  10.1021/ic302787z

文献信息

• [EN] PRECURSORS FOR ATOMIC LAYER DEPOSITION<br/>[FR] PRÉCURSEURS POUR DÉPÔT DE COUCHE ATOMIQUE
  申请人：UNIV WAYNE STATE

  公开号：WO2013188377A1

  公开（公告）日：2013-12-19

  Atomic layer deposition (ALD) and chemical vapor deposition (CVD) precursors that are useful for forming metal-containing films are provided. These compounds include triazapentadienyl -imino enolate compounds and α-imino ketone compounds having formulae 1, 2, and 3, respectively. An ALD method using the precursors is also provided.

  提供了用于形成含金属薄膜的原子层沉积（ALD）和化学气相沉积（CVD）前体。这些化合物包括具有分别为1、2和3的公式的三氮杂戊二烯基-亚胺烯醇化合物和α-亚胺酮化合物。还提供了使用这些前体的ALD方法。