An active-light-sensitive or radiation-sensitive resin composition includes a resin (A) and a photoacid generator (B) capable of generating an acid upon irradiation with active light or radiation, in which the active-light-sensitive or radiation-sensitive resin composition contains at least a photoacid generator (B1) represented by the following General Formula (1) and a photoacid generator (B2) other than the photoacid generator (B1) as the photoacid generator (B).
一种活性光敏或辐射敏感的
树脂组合物,包括
树脂(A)和光酸发生剂(B),该光酸发生剂(B)能够在活性光或辐射照射下生成酸,其中该活性光敏或辐射敏感的
树脂组合物至少包含由下式(1)表示的光酸发生剂(B1)和除光酸发生剂(B1)之外的另一种光酸发生剂(B2)作为光酸发生剂(B)。