4-phenyl-2,3,5,6-tetrafluorobenzene formic acid | 53987-59-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-phenyl-2,3,5,6-tetrafluorobenzene formic acid
• 英文别名: 2,3,5,6-tetrafluorobiphenyl-4-carboxylic acid；2,3,5,6-Tetrafluorbiphenyl-4-carbonsaeure；2,3,5,6-tetrafluoro-4-phenylbenzoic acid
• CAS: 53987-59-0
• 化学式: C₁₃H₆F₄O₂
• 分子量: 270.183
• InChiKey: MVFMACFGAIIUBH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  19
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  4-phenyl-2,3,5,6-tetrafluorobenzene formic acid 在 potassium fluoride 作用下， 以 N,N-二甲基甲酰胺 为溶剂， 生成 2,3,5,6-四氟-1,1'-联苯
  参考文献：
  名称：

  Gerasimova,T.N. et al., Journal of Organic Chemistry USSR (English Translation), 1974, vol. 10, p. 2181 - 2185

  摘要：

  DOI：
• 作为产物：
  描述：

  methyl 2,3,5,6-tetrafluoro-[1,1'-biphenyl]-4-carboxylate 在 potassium hydroxide 作用下， 以 甲醇 为溶剂， 生成 4-phenyl-2,3,5,6-tetrafluorobenzene formic acid
  参考文献：
  名称：

  多氟苯甲酸锌 (II) 与芳基溴和九氟甲磺酸酯的温和脱羧交叉偶联：获得多氟联芳基化合物

  摘要：

  我们开发了一种钯催化的多氟苯甲酸锌脱羧交叉偶联方法，用作原位生产锌试剂的前体，与芳基溴和九氟磺酸盐发生反应，为多氟联芳基化合物的合成提供了一条温和有效的途径。该协议具有广泛的底物范围和出色的功能耐受性。此外，药物、生物活性分子和农药的直接后期修饰证明了这种方法的多功能性，表明其在药物发现中的潜在意义。

  DOI：

  10.1021/acs.orglett.3c03730

文献信息

• ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20200223796A1

  公开（公告）日：2020-07-16

  A novel onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in exposure latitude, MEF, and LWR.

  提供了一种化学增感剂组合物，其中包括式（1）的新型离子盐作为PAG。当使用KrF或ArF准分子激光、EB或EUV进行光刻工艺处理时，该抗蚀组合物具有高灵敏度、减少酸扩散，并在曝光宽度、MEF和LWR方面得到改善。
• ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20200369605A1

  公开（公告）日：2020-11-26

  An onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by lithography, the resist composition exhibits a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

  提供一种化学式为（1）的铵盐和包括该铵盐作为PAG的化学增感抗蚀组合物。通过光刻加工时，该抗蚀组合物表现出高灵敏度，最小LWR和改善的CDU，无论其为正像还是负像。
• NOVEL SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20200159115A1

  公开（公告）日：2020-05-21

  A novel salt having an amide bond in its anion structure is provided. A chemically amplified resist composition comprising the salt has advantages including minimal defects and improved values of sensitivity, LWR, MEF and CDU, when processed by lithography using high-energy radiation such as KrF excimer laser, ArF excimer laser, EB or EUV.

  提供了一种其阴离子结构中具有酰胺键的新型盐。包含该盐的化学放大型光刻胶组合物具有许多优点，包括在使用高能辐射（如KrF准分子激光、ArF准分子激光、电子束或EUV）进行光刻加工时，缺陷最小、灵敏度、LWR、MEF和CDU值得到改善。
• MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170008982A1

  公开（公告）日：2017-01-12

  A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.

  一种聚合物，包含由可聚合单体衍生的重复单元，该单体具有两种羟基苯甲酸甲酯结构，羟基上取代有酸不稳定基团，作为正性光刻胶组成中的基础树脂，尤其是化学放大正性光刻胶组成中。该光刻胶组成形成一种光刻胶膜，通过光刻技术加工成具有高分辨率、最小边缘粗糙度和蚀刻抗性的良好轮廓图案。
• SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20220107560A1

  公开（公告）日：2022-04-07

  A sulfonium salt having formula (1) is novel. A chemically amplified resist composition comprising the sulfonium salt as a PAG has advantages including solvent solubility and improved lithography properties such as EL and LWR when processed by photolithography using high-energy radiation such as KrF or ArF excimer laser, EB or EUV.

  一种具有式（1）的硫铵盐是新颖的。包含该硫铵盐作为PAG的化学增感抗蚀剂组成物具有溶剂溶解性和改善的光刻特性，例如EL和LWR，当使用高能辐射进行光刻，如KrF或ArF准分子激光、EB或EUV。