Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
申请人:——
公开号:US20030091925A1
公开(公告)日:2003-05-15
Copolymers containing the units A, B, C, D and optionally E are used to prepare radiation sensitive compositions and lithographic printing plates. The copolymer contains about 25 to 55 mol % of unit A which has the formula
1
The copolymer contains about 0.5 to 25 mol % of unit B which has the formula
2
wherein R
1
is selected from the group consisting of alkyl, aryl and aralkyl. The copolymer contains about 0.5 to 40 mol % of unit C which has the formula
3
wherein X is an aliphatic or aromatic spacer group, and Ac is an acidic group selected from the group consisting of —COOH, —SO
3
H, —SO
2
NR
9
R
10
with R
9
and R
10
independently being selected from hydrogen and alkyl; and when X is phenylene, Ac can also be OH.
The copolymer contains about 20 to 70 mol % of unit D which has the formula
4
wherein Ci is selected from the group consisting of Ci-1, Ci-2, Ci-3 and Ci-4 which are represented by the following formulae
5
wherein:
k, m and n are integers independently selected from 0 to 5,
R
3
, R
4
and R
7
are independently selected from the group consisting of alkyl, alkoxy, —COOR
8
, —NR
9
R
10
, —NH—CO—CH
3
, halogen, and cyano,
R
8
is selected from hydrogen and alkyl,
R
9
and R
10
are independently selected from hydrogen and alkyl,
R
5
is selected from the group consisting of hydrogen, alkyl, aryl and aralkyl,
R
6
is selected from the group consisting of alkyl, aryl and aralkyl and
Y is selected from the group consisting of alkylene, arylene and arylenealkylene.
The copolymer contains about 0 to 50 mol % of unit E which has the formula
6
wherein R
2
is selected from the group consisting of alkyl, aryl and aralkyl groups.
含有 A、B、C、D 和 E 单元的共聚物可用于制备辐射敏感性组合物和平版印刷板。共聚物含有约 25 至 55 摩尔%的单元 A,其式为
1
共聚物含有约 0.5 至 25 摩尔%的单元 B,其式为
2
其中 R
1
选自由烷基、芳基和芳烷基组成的组。共聚物含有约 0.5 至 40 摩尔%的单元 C,其式为
3
其中 X 为脂肪族或芳香族间隔基,Ac 为酸性基团,选自由 -COOH、-SO
3
H、-SO
2
NR
9
R
10
与 R
9
和 R
10
独立地选自氢和烷基;当 X 为亚苯基时,Ac 也可以是 OH。
共聚物含有约 20 至 70 摩尔%的单元 D,其式为
4
其中 Ci 选自 Ci-1、Ci-2、Ci-3 和 Ci-4,它们由下式表示
5
其中
k、m 和 n 是独立选自 0 至 5 的整数、
R
3
, R
4
和 R
7
独立地选自由烷基、烷氧基、-COOR
8
、-NR
9
R
10
, -NH-CO-CH
3
卤素和氰基、
R
8
选自氢和烷基、
R
9
和 R
10
独立选自氢和烷基、
R
5
选自由氢、烷基、芳基和芳烷基组成的组、
R
6
选自由烷基、芳基和芳烷基组成的组,以及
Y 选自亚烷基、芳基和亚芳基烷基组成的组。
共聚物含有约 0 至 50 摩尔%的单元 E,其式为
6
其中 R
2
选自由烷基、芳基和芳烷基组成的组。