RESIST COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
申请人:FujiFilm Corporation
公开号:US20190219922A1
公开(公告)日:2019-07-18
There is provided a resist composition containing a resin. The resin includes a repeating unit (a) having one or more *—OY
0
groups substituted for an aromatic ring; and a phenolic hydroxyl group (b) or a partial structure (c) represented by Formula (X). Here, the *—OY
0
group is a group that is decomposed due to an action of an acid to generate a phenolic hydroxyl group, and Y
0
is a specific protective group. In a case where the repeating unit (a) includes none of the phenolic hydroxyl group (b) and the partial structure (c), the repeating unit (a) is a repeating unit in which the *—OY
0
group is decomposed due to an action of an acid to generate two or more phenolic hydroxyl groups.
Gerasimova,T.N. et al., Journal of Organic Chemistry USSR (English Translation), 1969, vol. 5, p. 2137 - 2141
作者:Gerasimova,T.N. et al.
DOI:——
日期:——
Anichkina,S.A. et al., Journal of general chemistry of the USSR, 1969, vol. 39, p. 1730 - 1736