申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US10295905B2
公开(公告)日:2019-05-21
A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0″ is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.
一种抗蚀剂组合物,该组合物在曝光时会产生一种酸,其在显影溶液上的溶解度会在酸的作用下发生变化,该组合物包括一种具有由式(a0-1)、(a0-2)和(a0-3)表示的单元的聚合物化合物,其含量为 0 至 10 摩尔%。在这些式子中,R 是氢原子、具有 1 至 5 个碳原子的烷基或具有 1 至 5 个碳原子的卤代烷基,Va01 和 Va03 是二价烃基,na01 和 na03 各为 0 至 2 的整数、Ra0″ 是特定的酸可解离基团,Va02 是含有杂原子或单键的二价连接基团,Ra07 是一价有机基团,na021 是 0 至 3 的整数,na022 是 1 至 3 的整数。