6-ethyl-7-methoxy-4-methylcoumarin | 109159-90-2

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 香豆素及其衍生物
• 英文名称: 6-ethyl-7-methoxy-4-methylcoumarin
• 英文别名: 6-ethyl-7-methoxy-4-methyl-coumarin；6-Aethyl-7-methoxy-4-methyl-cumarin；6-ethyl-7-methoxy-4-methyl-2H-chromen-2-one；6-ethyl-7-methoxy-4-methylchromen-2-one
• CAS: 109159-90-2
• 化学式: C₁₃H₁₄O₃
• mdl: MFCD01328410
• 分子量: 218.252
• InChiKey: VTCWTXNMVRIVEE-UHFFFAOYSA-N

物化性质

• 熔点：
  162-163 °C
• 沸点：
  361.0±42.0 °C(Predicted)
• 密度：
  1.137±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  16
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.307
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  6-ethyl-7-methoxy-4-methylcoumarin 在 chlorosulphuric acid 作用下， 生成 6-ethyl-7-methoxy-4-methyl-2-oxo-2H-chromene-3-sulfonic acid anilide
  参考文献：
  名称：

  Substitution in the Benzopyrone Series. IV. Sulfonation of Coumarin Derivatives

  摘要：

  DOI：

  10.1021/jo01359a007
• 作为产物：
  描述：

  4-乙基间苯二酚 在 硫酸 作用下， 生成 6-ethyl-7-methoxy-4-methylcoumarin
  参考文献：
  名称：

  Desai; Ekhlas, Proceedings - Indian Academy of Sciences, Section A, 1938, # 8, p. 194,199

  摘要：

  DOI：

文献信息

• Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
  申请人：Canon Kabushiki Kaisha

  公开号：EP1956430A1

  公开（公告）日：2008-08-13

  A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R1 to R5 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, acetoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.

  光敏化合物分子中有两个或多个结构单元，由以下通式（1）表示： 其中 R1 至 R5 选自氢原子、卤素原子、烷基、烷氧基、乙酰氧基、苯基、萘基和部分或全部氢原子被氟原子取代的烷基组成的组；X 为取代或未取代的亚苯基或取代或未取代的萘基。
• EFFICIENT PREPARATION OF 4-SUBSTITUTED-6-ACYL-7-METHOXYCOUMARINS
  作者：M. V. Paradkar、M. S. Kulkarni、S. A. Kulkarni、H. M. Godbole

  DOI：10.1080/00304949609356542

  日期：1996.6
• Limaye; Limaye, Rasayanam, 1941, vol. 1, p. 201,205
  作者：Limaye、Limaye

  DOI：——

  日期：——
• Usgaonkar et al., Journal of the Indian Chemical Society, 1953, vol. 30, p. 535,536
  作者：Usgaonkar et al.

  DOI：——

  日期：——
• PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS
  申请人：Ito Toshiki

  公开号：US20080187864A1

  公开（公告）日：2008-08-07

  A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R 1 to R 5 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, acetoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.