Compounds for forming photoconvertible organic thin film and organic thin film formed body
申请人:Nippon Soda Co., Ltd.
公开号:US07470803B2
公开(公告)日:2008-12-30
The present invention relates to a compound which is flexibly amenable to the alteration, without impairing its photosensitivity, of its structural moiety which affects film forming ability and the resulting surface properties, the compound being capable of undergoing surface alteration by irradiation with relatively low energy wavelength, and of forming an organic thin film on a substrate with good reproducibility, and an organic thin film formed body, the compound being represented by formula (1). (In the formula, X represents a heteroatom-containing functional group capable of interacting with a surface of a metal or a metallic oxide, R represents a C1 to C20 alkyl group, a C1 to C20 alkoxy group, an aryl group, or a C1 to C20 alkoxycarbonyl group; n represents an integer of 1 to 30, and m represents an integer of 0 to 5; G1 represents a single bond or a bivalent hydrocarbon radical having carbon atoms of 1 to 3; Ar represents an aromatic group which may have a substituent; G2 represents O, S, or Nr.)
本发明涉及一种化合物,其能够灵活地改变其结构基团,而不会影响其光敏性,该结构基团影响薄膜形成能力和所得到的表面性质,该化合物能够通过较低能量波长的辐照而发生表面改变,并且能够在基底上形成有良好再现性的有机薄膜,以及形成的有机薄膜体,该化合物由式(1)表示。(在式中,X表示能够与金属或金属氧化物表面相互作用的含杂原子的功能基团,R表示C1至C20烷基,C1至C20烷氧基,芳基或C1至C20烷氧羰基;n表示1至30的整数,m表示0至5的整数;G1表示单键或具有1至3个碳原子的双价碳氢基团;Ar表示可以有取代基的芳基;G2表示O、S或Nr。)