BISPHENOL COMPOSITION CONTAINING AROMATIC ALCOHOL SULFONATE AND METHOD FOR PRODUCING SAME, POLYCARBONATE RESIN AND METHOD FOR PRODUCING SAME, AND BISPHENOL PRODUCTION METHOD
BISPHENOL COMPOSITION CONTAINING AROMATIC ALCOHOL SULFONATE AND METHOD FOR PRODUCING SAME, POLYCARBONATE RESIN AND METHOD FOR PRODUCING SAME, AND BISPHENOL PRODUCTION METHOD
申请人:MITSUBISHI CHEMICAL CORPORATION
公开号:US20200190004A1
公开(公告)日:2020-06-18
A bisphenol composition including a specific amount of aromatic alcohol sulfonate, and a simple method of producing it are provided. Also provided is a method of producing a polycarbonate resin in which, by using the bisphenol composition including a specific amount of aromatic alcohol sulfonate, melt polymerization reaction can be efficiently allowed to proceed to produce a polycarbonate resin having an excellent color tone. A bisphenol composition including an aromatic alcohol sulfonate at not less than 0.1 ppb by mass with respect to a bisphenol. A method of producing a bisphenol composition, including reacting a ketone or an aldehyde with an aromatic alcohol in the presence of sulfuric acid to produce a bisphenol composition. A method of producing a polycarbonate resin, including producing a polycarbonate resin using the bisphenol composition. A polycarbonate resin including a specific amount of aromatic alcohol sulfonate.
Optically active compound and photosensitive resin composition
申请人:——
公开号:US20030211421A1
公开(公告)日:2003-11-13
A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):
A
−[(
J
)
m
−(
X-Pro
)]
n
(1)
wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1.
The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.
一种光活性化合物与光敏剂结合使用,由以下公式(1)表示:
A
−[(
J
)
m
−(
X-Pro
)]
n
(1)
其中,A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元,J代表连接基团,X-Pro代表由光照可去除的保护基团Pro保护的亲水基团,m代表0或1,n代表不少于1的整数。
保护基团Pro可以与光敏剂(特别是光酸发生剂)一起通过光照可去除,也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性,用于光刻应用,因此,该光活性化合物有利于形成具有高分辨率的图案。
Silylated polycarbonate polymers, method of making, and articles
申请人:Lens Jan Pleun
公开号:US20080306294A1
公开(公告)日:2008-12-11
A silylated dihydroxy aromatic compound of the formula (1a);
wherein G
a
and G
b
are each independently C
1-12
alkyl, —OSi(C
1-12
alkyl)
3
, C
1-12
arylalkyl, or —OSi(C
1-12
arylalkyl)
3
; Z
a
and Z
b
are each independently a straight or branched C
2-18
alkylene, a C
8-18
arylalkylene, or a C
8-18
alkylarylene, X
a
is a direct bond, a heteroatom-containing group, or a C
1-18
organic group, and r and s are each independently 1 or 2 is disclosed.
MODIFIER FOR AROMATIC POLYESTER AND AROMATIC POLYESTER RESIN COMPOSITION COMPRISING THE SAME
申请人:TABATA Masayoshi
公开号:US20110224343A1
公开(公告)日:2011-09-15
The present invention provides a modifier for aromatic polyesters which enhances the melt fluidity of aromatic polyesters without a significant decrease in the heat resistance of the aromatic polyesters, and an aromatic polyester resin composition including the modifier for aromatic polyesters. The present invention relates to a modifier for aromatic polyesters comprising polyhydric phenol residues and residues of aromatic polycarboxylic acid, acid halide or acid anhydride thereof, and the modifier comprises a material having a structure composed of a first residue selected from the group consisting of divalent residues represented by Formula (I): —Ar—W
1
x
—Ar— and by Formula (II): —Ar—, the first residues being bonded to two identical or different second residues selected from the group consisting of monovalent residues represented by Formula (III):
and monovalent residues represented by Formula (IV): —O—C(O)—R
7
—.
[EN] SILICONE CONDENSATION REACTION<br/>[FR] REACTION DE CONDENSATION DE SILICONE
申请人:GEN ELECTRIC
公开号:WO2006020752A1
公开(公告)日:2006-02-23
A new silicone condensation reaction, the condensation between an alkoxy silane or siloxane or a dihydric phenol and an organo-hydrosilane or siloxane and catalysts therefore is described and claimed.