Solvents effects in reactions between perfluoroalkyliodides and cadmium
作者:Grace J. Chen、Christ Tamborski
DOI:10.1016/s0022-1139(00)81020-9
日期:1987.7
the other hand ICF2CF2I and C1CF2CFC1I, by a 1,2-dehalogenation reaction, form the olefins CF2 = CF2 and CF2 = CFC1, respectively, as the principal products. The interaction of RfI compounds with cadmium in other solvent media, e.g. diethyl ether. tetrahydrofuran (THF), N,N-dimethylformamide (DMF), and bis(2-methoxyethyl)ether(diglyme) were examined and found to produce a different ratio of RfRf and
全氟有机碘化物(R f I,其中R f = F(CF 3)2 C(CF 2 CF 2)3,nC 6 F 13,nC 8 F 17,F(CF 3)2 COCF 2 CF 2,F之间的相互作用(CF 3)2 CO(CF 2 CF 2)4和C 2 H 5 OC(O)(CF 2 CF 2)与乙腈溶剂介质中的镉混合后,除少量还原产物(R f H)外,主要产生偶联产物(R f R f,产率72-90%)。另一方面,ICF 2 CF 2 I和C1CF 2 CFC1I通过1,2-脱卤反应分别形成烯烃CF 2= CF 2和CF 2= CFC1,作为主要产物。R f I化合物与镉在其他溶剂介质(例如乙醚)中的相互作用。检查了四氢呋喃(THF),N,N-二甲基甲酰胺(DMF)和双(2-甲氧基乙基)醚(二甘醇二甲醚),发现产生不同比例的R fR f和R f H产物。ft *}当前地址:Fluidics Inc.
METHOD FOR FORMING MULTILAYER RESIST
申请人:DAIKIN INDUSTRIES, LTD.
公开号:EP1686425A1
公开(公告)日:2006-08-02
There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L1) on a substrate and (II) a step for forming the antireflection layer (L2) on the photoresist layer (L1) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50 % by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.
形成了一种层状光刻胶,它在使用真空紫外区光的光刻工艺中显示出足够的减反射效果,并且在显影工艺中具有足够的显影特性。形成层状光刻胶的方法包括:(I) 在基底上形成光刻胶层 (L1) 的步骤;(II) 在光刻胶层 (L1) 上形成抗反射层 (L2) 的步骤,该步骤通过涂敷含有亲水基团 Y 的含氟聚合物 (A) 的涂层组合物来实现。含氟聚合物(A)含有由具有亲水基团 Y 的含氟乙烯单体衍生的结构单元,其特征在于:(i) 亲水基团 Y 含有 pKa 值不大于 11 的酸性 OH 基团;(ii) 氟含量不小于 50%(按质量计);(iii) 100 克含氟聚合物(A)中亲水基团 Y 的摩尔数不小于 0.14。
Electrochemical synthesis of perfluoroalkylchlorides
作者:V. A. Grinberg、V. F. Cherstkov、S. R. Sterlin、Yu. B. Vasil'ev、L. S. German
DOI:10.1007/bf00961499
日期:1990.8
Electrooxidation of perfluorocarboxylic acids in the presence of Cl2 yields perfluoroalkylchlorides R(F)Cl. It is suggested that anodic oxidation of perfluorocarboxylate ions is the determining electrochemical stage in this electrochemical version of the Borodin-Hundsdikker reaction.
Conformational energies of perfluoroalkanes. 5. Dipole moments of H(CF2)nH and H(CF2)nI
作者:Keizo Matsuo、Walter H. Stockmayer
DOI:10.1021/j150622a020
日期:1981.10
Levin,A.I. et al., Journal of general chemistry of the USSR, 1965, vol. 35, p. 1776 - 1778