Trityl hydrazides and formyl-phenyl hydrazines are useful as co-developers with hindered phenols in phothothermographic and thermographic elements. These co-developers have the formula:
R1-(C=O)n-NHNH-R2
R1 represents hydrogen and R2 represents an aryl or substituted aryl group; or,
R1 represents hydrogen, alkyl and alkenyl groups of up to 20 carbon atoms; alkoxy, thioalkoxy, or amido groups of up to 20 carbon atoms; aryl, alkaryl, or aralkyl groups of up to 20 carbon atoms; aryloxy, thioaryloxy, or anilino groups of up to 20 carbon atoms; aliphatic or aromatic heterocyclic ring groups containing up to 6 ring atoms; carbocyclic ring groups comprising up to 6 ring carbon atoms; or fused ring or bridging groups comprising up to 14 ring atoms; and R2 represents a trityl group.
The photothermographic and thermographic elements in the present invention may be used as a photomask in a process where there is a subsequent exposure of an ultraviolet or short wavelength visible radiation sensitive imageable medium.
三苯甲基
肼和甲酰基苯基
肼可与受阻
酚一起作为显影剂用于相热和热成像元件。这些共显影剂的
化学式如下
R1-(C=O)n-NHNH-R2
R1 代表氢,R2 代表芳基或取代芳基;或
R1 代表氢、多达 20 个碳原子的烷基和烯基;多达 20 个碳原子的烷氧基、
硫代烷氧基或
氨基;多达 20 个碳原子的芳基、烷芳基或芳烷基;多达 20 个碳原子的芳氧基、
硫代芳氧基或
苯胺基;含有多达 6 个环原子的脂肪族或芳香族杂环基团;含有多达 6 个环碳原子的碳环基团;或含有多达 14 个环原子的熔合环或桥基;以及 R2 代表三烷基。
本发明中的光热成像和热成像元件可在随后对紫外线或短波长可见光辐射敏感的可成像介质进行曝光的工艺中用作光掩膜。