BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:Hatakeyama Jun
公开号:US20120141938A1
公开(公告)日:2012-06-07
A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.
Chemical and physical properties of fluorenylidene: equilibration of the singlet and triplet carbenes
作者:Peter B. Grasse、Beth Ellen Brauer、Joseph J. Zupancic、Kenneth J. Kaufmann、Gary B. Schuster
DOI:10.1021/ja00361a014
日期:1983.11
Formationde fluorenylidene par photolyse laser pulsee de diazo-9 fluorene a temperature ambiante ou a 10 K. Espece a l'etat d'equilibre entre carbenes singulet et triplet. Reactions du fluorenylidene avec l'acetonitrile, le cyclohexane et divers alcools et olefines. Spectres d'absorption visible. Mecanismes. Produits de cyclopropanation
形成 de fluorenylidene par 光解激光脉冲 de diazo-9 芴 a 温度 ambiante ou a 10 K. Espece a l'etat d'equilibre entre carbenes singulet et 三重峰。反应 du fluorenylidene avec l'乙腈、le 环己烷和 divers alcools 和烯烃。幽灵d'吸收可见。机制。环丙烷化产品
RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20170115566A1
公开(公告)日:2017-04-27
A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.
Water Compatible Gold(III)-Catalysed Synthesis of Unsymmetrical Ethers from Alcohols
作者:Ana B. Cuenca、Gisela Mancha、Gregorio Asensio、Mercedes Medio-Simón
DOI:10.1002/chem.200701134
日期:2008.2.8
preparation of unsymmetricalethersfromalcohols catalysed by the simplest and least expensive gold catalyst, NaAuCl(4), is described for the first time. The procedure enables the etherification of benzylic and tertiary alcohols with moderate to good yields under mild conditions with low catalyst loading. Symmetrical ethers, the usual side products in the etherification of alcohols, were not detected
RESIST UNDERLAYER FILM COMPOSTION, PATTERNING PROCESS, AND COMPOUND
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20170018436A1
公开(公告)日:2017-01-19
The present invention provides a resist underlayer film composition for lithography, containing a compound having an indenofluorene structure. This resist underlayer film composition is excellent in filling property, generates little outgas, and has high heat resistance.