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2-diazo-1-naphthoquinone-5-sulfonate ester of 4-hydroxybenzophenone | 63669-79-4

中文名称
——
中文别名
——
英文名称
2-diazo-1-naphthoquinone-5-sulfonate ester of 4-hydroxybenzophenone
英文别名
4-(2-Diazo-1-oxo-1,2-dihydro-naphthalene-5-sulfonyl-xy)-benzophenone;4-(1,2-naphthoquinone-2-diazide-5-sulfonyl-oxy)-benzophenone;2-diazonaphthalenone 5-sulfonyl ester of p-hydroxybenzophenone;5-(4-Benzoylphenoxy)sulfonyl-2-diazonionaphthalen-1-olate
2-diazo-1-naphthoquinone-5-sulfonate ester of 4-hydroxybenzophenone化学式
CAS
63669-79-4
化学式
C23H14N2O5S
mdl
——
分子量
430.441
InChiKey
YCPTVRHETSDBJH-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    6.6
  • 重原子数:
    31
  • 可旋转键数:
    5
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    120
  • 氢给体数:
    0
  • 氢受体数:
    6

SDS

SDS:ba9f9ca2ebe04035006cd32bcaad6bf7
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上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为反应物:
    描述:
    2-diazo-1-naphthoquinone-5-sulfonate ester of 4-hydroxybenzophenone溶剂黄146三乙胺 作用下, 以 乙醇 为溶剂, 反应 5.5h, 生成 4-(Inden-4-sulfonyl-oxy)-benzophenone
    参考文献:
    名称:
    Schuster, C.; Bendig, J., Journal fuer Praktische Chemie (Leipzig), 1991, vol. 333, # 1, p. 91 - 99
    摘要:
    DOI:
  • 作为产物:
    参考文献:
    名称:
    Reduction processes in the fast atom bombardment mass spectrometry of sulfonyl esters of diazonaphthalenones
    摘要:
    AbstractOrthoquinone diazides, which are widely used in microlithography, have attracted considerable attention, especially in terms of their application in the production of high‐contrast resists. Previous electron impact mass spectrometric results have confirmed that the primary fragmentation process of these compounds is the elimination of N2 to form an indenoketene ion. This is analogous to the photodecomposition pathway which makes them effective in the lithographic process. Those results also revealed the occurrence of an alternative process, which involves a two‐hydrogen reduction of the intermediate species formed prior to conversion to the ketene. The present study investigates the behaviour of the orthoquinone diazides when there is an abundance of protons available to form the reduction product. Several different types of diazonaphthalenone sulfonyl esters, ranging in complexity from the monosubstituted phenol esters to disubstituted dihydroxybenzophenones, were examined using fast atom bombardment mass spectrometry. Although reduction was the primary process in the hydrogen‐rich matrices, the extent of reduction was characteristic of the particular isomer as well as the matrix used.
    DOI:
    10.1002/oms.1210230604
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文献信息

  • Reduction processes in the fast atom bombardment mass spectrometry of sulfonyl esters of diazonaphthalenones
    作者:James N. Kyranos、Bertrand M. Du Sorbier、John Wronka、Paul Vouros、Daniel P. Kirby
    DOI:10.1002/oms.1210230604
    日期:1988.6
    AbstractOrthoquinone diazides, which are widely used in microlithography, have attracted considerable attention, especially in terms of their application in the production of high‐contrast resists. Previous electron impact mass spectrometric results have confirmed that the primary fragmentation process of these compounds is the elimination of N2 to form an indenoketene ion. This is analogous to the photodecomposition pathway which makes them effective in the lithographic process. Those results also revealed the occurrence of an alternative process, which involves a two‐hydrogen reduction of the intermediate species formed prior to conversion to the ketene. The present study investigates the behaviour of the orthoquinone diazides when there is an abundance of protons available to form the reduction product. Several different types of diazonaphthalenone sulfonyl esters, ranging in complexity from the monosubstituted phenol esters to disubstituted dihydroxybenzophenones, were examined using fast atom bombardment mass spectrometry. Although reduction was the primary process in the hydrogen‐rich matrices, the extent of reduction was characteristic of the particular isomer as well as the matrix used.
  • Electron-beam-induced Wolff rearrangement
    作者:J. Pacansky、H. Coufal
    DOI:10.1021/ja00521a086
    日期:1980.1
  • Chromophore specific photoreactivity in 2,3,4-Tri(1,2-naphthoquinone-2-diazide-5-sulfonyl-oxy)-benzophenone
    作者:C. Schuster、J. Bendig、K. Neuman
    DOI:10.1002/prac.19943360805
    日期:——
    Different electronic structures for the three 1,2-naphthoquinone-2-diazide (NQD) chromophores in 2,3,4-tri (1,2-naphthoquinone-2-diazide-5-sulfonyl-oxy)-benzophenone were detected using H-1 NMR spectroscopy. The NQD substituent in the o-position of the benzophenone is influenced by intramolecular through space interactions with the benzophenone part of the molecule. The change in the electronic structure is the reason for the obtained different photoreactivity of the o-NQD chromophore compared with m-NQD and p-NQD. The relative quantum yields of photolysis are 0.3 (o-NQD) and 0.9/1.0 (m-NQD/p-NQD).
  • Schuster, C.; Bendig, J., Journal fuer Praktische Chemie (Leipzig), 1991, vol. 333, # 1, p. 91 - 99
    作者:Schuster, C.、Bendig, J.
    DOI:——
    日期:——
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