Thermoacid Generator for Antireflection Film Formation, Composition for Antireflection Film Formation, and Antireflection Film Made Therefrom
申请人:Kawana Daisuke
公开号:US20090130595A1
公开(公告)日:2009-05-21
A thermoacid generator for antireflective film formation, characterized by being represented by the following formula (1):
(wherein R
1
represents C
1-20
alkyl, alkenyl, oxoalkyl, or oxoalkenyl (hydrogen atoms in these groups may have been replaced with fluorine atoms); R
2
represents linear, branched, or cyclic C
1-20
alkyl, alkenyl, oxoalkyl, or oxoalkenyl, C
6-20
aryl, or C
7-12
aralkyl or aryloxoalkyl; R
3
represents hydrogen or alkyl; and Y
−
represents a non-nucleophilic counter ion); a composition for forming an antireflective film; and an antireflective film made from the composition. With the thermoacid generator and composition, satisfactory etching resistance and the satisfactory ability to prevent the reflection of short-wavelength light (ability to absorb short-wavelength light) are attained. Furthermore, the antireflective film can inhibit an overlying photoresist film from generating a scum.
一种用于制备防反射膜的热酸发生剂,其特征在于由以下公式(1)所表示:(其中R1代表C1-20烷基,烯基,氧代烷基或氧代烯基(这些基团中的氢原子可能已被氟原子取代); R2代表线性,支链或环状C1-20烷基,烯基,氧代烷基或氧代烯基,C6-20芳基或C7-12芳基氧代烷基; R3代表氢或烷基; Y-代表非亲核对离子);用于形成防反射膜的组合物;以及由该组合物制成的防反射膜。使用该热酸发生剂和组合物,可以获得令人满意的蚀刻抗性和防止短波长光的反射的能力(吸收短波长光的能力)。此外,该防反射膜可以抑制上层光阻膜产生污点。