PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY
申请人:Yamagishi Takanori
公开号:US20100048848A1
公开(公告)日:2010-02-25
To provide a method for producing a polymer for semiconductor lithography which can attain high uniformity in the polymer from lot to lot.
The method for producing a polymer for semiconductor lithography includes the step (P) of heating a polymerizable monomer and a polymerization initiator in a solvent, to thereby polymerize the monomer, the step (P) having the step of controlling a polymerization pressure by regulating a liquid level in a container (WO) which is disposed between a polymerization tank and the atmospheric air and which provides liquid sealing.
METHOD FOR PRODUCING A COPOLYMER FOR PHOTORESIST
申请人:Oikawa Tomo
公开号:US20100222526A1
公开(公告)日:2010-09-02
The present invention provides a method for production of a copolymer for photoresists in which the bias of the monomer composition ration is small. This method for production is a method for production of a copolymer for photoresists, which copolymer containing at least two types of repeating units, the method having a supplying step of supplying a monomer solution and a solution containing a polymerization initiator into a polymerization reaction system, wherein the range of fluctuation of the monomer composition ratio of unreacted monomers is within the range between minus 15% and plus 15% or the standard deviation of the monomer composition ratio of unreacted monomers is within 2 in the polymerization reaction system during the period from the start of the polymerization reaction to the end of supplying of the monomer solution.